Please use this identifier to cite or link to this item: http://scholarbank.nus.edu.sg/handle/10635/14572
Title: Thermal conductivity of thin films
Authors: KHAIRUL HABIB
Keywords: Thin fil
Issue Date: 6-May-2005
Source: KHAIRUL HABIB (2005-05-06). Thermal conductivity of thin films. ScholarBank@NUS Repository.
Abstract: This thesis presents the evaluation of thermal conductivity of thin films of silicon dioxide on silicon substrate. The method used for measuring the thermal conductivity is named as 3 omega method which can operate within a temperature range of 20K to 320K. This method, first proposed by David G. Cahill [7] is a method where a metallic strip remained in close contact with the specimen surface. The details of 3 omega method will be described in the later chapter of this thesis.In this thesis, a mathematical modeling of 3 omega method is presented. The thermal conductivity of thin film was measured by 3 omega method. The data were taken from 20K to 120K. At temperatures of 20K, 30K, 50K and 80K the values of thermal conductivities of 0.14, 0.24, 0.35 and 0.55 W/m-K were obtained, respectively. At 90K, 100K, 110K, 120K the values of thermal conductivities of 0.62, 0.69, 0.77 and 0.84 W/m-K were obtained, respectively. The results show that the values obtained by 3 omega method match closely with the Cahilla??s [7] results within a temperature range of 20K to 120K.
URI: http://scholarbank.nus.edu.sg/handle/10635/14572
Appears in Collections:Master's Theses (Open)

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02Acknowledgements.pdf93.87 kBAdobe PDF

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03Nomenclature.pdf50.62 kBAdobe PDF

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04List of figures.pdf80.31 kBAdobe PDF

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06Chap.pdf124.23 kBAdobe PDF

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07Chap.pdf327.65 kBAdobe PDF

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08Chap.pdf104.04 kBAdobe PDF

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10Chap.pdf1.26 MBAdobe PDF

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11Chap.pdf139.76 kBAdobe PDF

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12Chap.pdf24.85 kBAdobe PDF

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13References.pdf85.88 kBAdobe PDF

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14Appendix A.pdf51.54 kBAdobe PDF

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15Appendix B.pdf84.73 kBAdobe PDF

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