Please use this identifier to cite or link to this item: http://scholarbank.nus.edu.sg/handle/10635/123525
Title: Parallel near-field photolithography with metal-coated elastomeric masks
Authors: Wu, Jin
Yu, Cheng-han 
Li, Shaozhou
Zou, Binghua
Liu, Yayuan
Zhu, Xiaoqun
Guo, Yuanyuan
Xu, Hongbo
Zhang, Weina
Zhang, Liping
Liu, Bin
Tian, Danbi
Huang, Wei
Sheetz, Michael P. 
Huo, Fengwei
Issue Date: 2015
Publisher: American Chemical Society
Source: Wu, Jin,Yu, Cheng-han,Li, Shaozhou,Zou, Binghua,Liu, Yayuan,Zhu, Xiaoqun,Guo, Yuanyuan,Xu, Hongbo,Zhang, Weina,Zhang, Liping,Liu, Bin,Tian, Danbi,Huang, Wei,Sheetz, Michael P.,Huo, Fengwei (2015). Parallel near-field photolithography with metal-coated elastomeric masks. Langmuir 31 (3) : 1210-1217. ScholarBank@NUS Repository.
Source Title: Langmuir
URI: http://scholarbank.nus.edu.sg/handle/10635/123525
ISSN: 07437463
Appears in Collections:Staff Publications

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