Please use this identifier to cite or link to this item:
https://scholarbank.nus.edu.sg/handle/10635/123525
| Title: | Parallel near-field photolithography with metal-coated elastomeric masks | Authors: | Wu, Jin Yu, Cheng-han Li, Shaozhou Zou, Binghua Liu, Yayuan Zhu, Xiaoqun Guo, Yuanyuan Xu, Hongbo Zhang, Weina Zhang, Liping Liu, Bin Tian, Danbi Huang, Wei Sheetz, Michael P. Huo, Fengwei |
Issue Date: | 2015 | Publisher: | American Chemical Society | Citation: | Wu, Jin, Yu, Cheng-han, Li, Shaozhou, Zou, Binghua, Liu, Yayuan, Zhu, Xiaoqun, Guo, Yuanyuan, Xu, Hongbo, Zhang, Weina, Zhang, Liping, Liu, Bin, Tian, Danbi, Huang, Wei, Sheetz, Michael P., Huo, Fengwei (2015). Parallel near-field photolithography with metal-coated elastomeric masks. Langmuir 31 (3) : 1210-1217. ScholarBank@NUS Repository. | Source Title: | Langmuir | URI: | http://scholarbank.nus.edu.sg/handle/10635/123525 | ISSN: | 07437463 |
| Appears in Collections: | Staff Publications |
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