Please use this identifier to cite or link to this item: https://doi.org/10.1186/1556-276X-7-416
Title: Silicon-based photonic crystals fabricated using proton beam writing combined with electrochemical etching method
Authors: Dang, Z.
Breese, M.B.H. 
Recio-Sánchez, G.
Azimi, S.
Song, J.
Liang, H.
Banas, A. 
Torres-Costa, V.
Martín-Palma, R.J.
Keywords: Defect density
Photonic band structure
Proton beam writing
Issue Date: 2012
Citation: Dang, Z., Breese, M.B.H., Recio-Sánchez, G., Azimi, S., Song, J., Liang, H., Banas, A., Torres-Costa, V., Martín-Palma, R.J. (2012). Silicon-based photonic crystals fabricated using proton beam writing combined with electrochemical etching method. Nanoscale Research Letters 7 : 1-7. ScholarBank@NUS Repository. https://doi.org/10.1186/1556-276X-7-416
Abstract: A method for fabrication of three-dimensional (3D) silicon nanostructures based on selective formation of porous silicon using ion beam irradiation of bulk p-type silicon followed by electrochemical etching is shown. It opens a route towards the fabrication of two-dimensional (2D) and 3D silicon-based photonic crystals with high flexibility and industrial compatibility. In this work, we present the fabrication of 2D photonic lattice and photonic slab structures and propose a process for the fabrication of 3D woodpile photonic crystals based on this approach. Simulated results of photonic band structures for the fabricated 2D photonic crystals show the presence of TE or TM gap in mid-infrared range. © 2012 Dang et al.
Source Title: Nanoscale Research Letters
URI: http://scholarbank.nus.edu.sg/handle/10635/116592
ISSN: 19317573
DOI: 10.1186/1556-276X-7-416
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