Substrate temperature studies of SrBi2(Ta1-xNbx)2O9 grown by pulsed laser ablation deposition

Please use this identifier to cite or link to this item: https://doi.org/10.1116/1.1426364

Title:	Substrate temperature studies of SrBi2(Ta1-xNbx)2O9 grown by pulsed laser ablation deposition
Authors:	Tay, S.T. Huan, C.H.A. Wee, A.T.S. Liu, R. Goh, W.C. Ong, C.K. Chen, G.S.
Issue Date:	Jan-2002
Citation:	Tay, S.T., Huan, C.H.A., Wee, A.T.S., Liu, R., Goh, W.C., Ong, C.K., Chen, G.S. (2002-01). Substrate temperature studies of SrBi2(Ta1-xNbx)2O9 grown by pulsed laser ablation deposition. Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films 20 (1) : 125-131. ScholarBank@NUS Repository. https://doi.org/10.1116/1.1426364
Abstract:	SrBi2(Ta1-xNbx)2O 9 thin films were deposited on Pt/TiOx/SiO2/Si substrates by pulsed laser ablation deposition. Film properties were determined by using x-ray diffraction (XRD), x-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), and secondary ion mass spectrometry (SIMS).
Source Title:	Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films
URI:	http://scholarbank.nus.edu.sg/handle/10635/113106
ISSN:	07342101
DOI:	10.1116/1.1426364
Appears in Collections:	Staff Publications

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