Please use this identifier to cite or link to this item: https://doi.org/10.1002/macp.200800074
Title: Two coexisting modes in field-assisted AFM nanopatterning of thin polymer films
Authors: Xie, X.N. 
Chung, H.J. 
Bandyopadhyay, D.
Sharma, A.
Sow, C.H. 
Bettiol, A.A. 
Wee, A.T.S. 
Keywords: Atomic force microscopy (AFM)
Films
Lithography
Microstructure
Issue Date: 3-Jul-2008
Citation: Xie, X.N., Chung, H.J., Bandyopadhyay, D., Sharma, A., Sow, C.H., Bettiol, A.A., Wee, A.T.S. (2008-07-03). Two coexisting modes in field-assisted AFM nanopatterning of thin polymer films. Macromolecular Chemistry and Physics 209 (13) : 1358-1366. ScholarBank@NUS Repository. https://doi.org/10.1002/macp.200800074
Abstract: Two coexisting mechanisms, i.e., electrohydrodynamic destabilization and electrostatic detachment, for polymer nanostructuring in field-assisted atomic force microscope nanolithography are presented. The electrohydrodynamic destabilization mechanism is based on the surface instability of molten polymer film in the form of surface waves, and it leads to the formation of well defined polymeric wave patterns. The electrostatic detachment mechanism is associated with nano-blister formation caused by pre-existing defects, such as buried cavities in the polymer, and is responsible for the creation of hollow pillar-like structures. Here, the coexistence and pattern formation probability of the two polymer patterning modes under similar nanolithographic conditions are discussed. It was found that the field strength and the efficiency of probe-induced joule heating can significantly change the flow property of the polymer, which eventually leads to the occurrence of the two modes. The results presented here are useful in obtaining a complete picture of the diverse behaviors of polymers in AFM nanolithographic operations. © 2008 WILEY-VCH Verlag GmbH & Co. KGaA.
Source Title: Macromolecular Chemistry and Physics
URI: http://scholarbank.nus.edu.sg/handle/10635/112660
ISSN: 10221352
DOI: 10.1002/macp.200800074
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