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|Title:||Sputtered deposited nanocrystalline ZnO films: A correlation between electrical, optical and microstructural properties|
|Citation:||Lee, J., Gao, W., Li, Z., Hodgson, M., Metson, J., Gong, H., Pal, U. (2005-05). Sputtered deposited nanocrystalline ZnO films: A correlation between electrical, optical and microstructural properties. Applied Physics A: Materials Science and Processing 80 (8) : 1641-1646. ScholarBank@NUS Repository. https://doi.org/10.1007/s00339-004-3197-6|
|Abstract:||Zinc oxide thin films were prepared by dc (direct current) and rf (radio frequency) magnetron sputtering on glass substrates. ZnO films produced by dc sputtering have a high resistance, while the films produced using rf sputtering are significantly more conductive. While the conductive films have a compact nodular surface morphology, the resistive films have a relatively porous surface with columnar structures in cross section. Compared to the dc sputtered films, rf sputtered films have a microstructure with smaller d spacing, lower internal stress, higher band gap energy and higher density. Dependence of conductivity on the deposition technique and the resulting d spacing, stress, density, band gap, film thickness and Al doping are discussed. Correlations between the electrical conductivity, microstructural parameters and optical properties of the films have been made. © Springer-Verlag 2004.|
|Source Title:||Applied Physics A: Materials Science and Processing|
|Appears in Collections:||Staff Publications|
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