Please use this identifier to cite or link to this item:
|Title:||Sputtered deposited nanocrystalline ZnO films: A correlation between electrical, optical and microstructural properties|
|Citation:||Lee, J., Gao, W., Li, Z., Hodgson, M., Metson, J., Gong, H., Pal, U. (2005-05). Sputtered deposited nanocrystalline ZnO films: A correlation between electrical, optical and microstructural properties. Applied Physics A: Materials Science and Processing 80 (8) : 1641-1646. ScholarBank@NUS Repository. https://doi.org/10.1007/s00339-004-3197-6|
|Abstract:||Zinc oxide thin films were prepared by dc (direct current) and rf (radio frequency) magnetron sputtering on glass substrates. ZnO films produced by dc sputtering have a high resistance, while the films produced using rf sputtering are significantly more conductive. While the conductive films have a compact nodular surface morphology, the resistive films have a relatively porous surface with columnar structures in cross section. Compared to the dc sputtered films, rf sputtered films have a microstructure with smaller d spacing, lower internal stress, higher band gap energy and higher density. Dependence of conductivity on the deposition technique and the resulting d spacing, stress, density, band gap, film thickness and Al doping are discussed. Correlations between the electrical conductivity, microstructural parameters and optical properties of the films have been made. © Springer-Verlag 2004.|
|Source Title:||Applied Physics A: Materials Science and Processing|
|Appears in Collections:||Staff Publications|
Show full item record
Files in This Item:
There are no files associated with this item.
checked on Jan 16, 2019
WEB OF SCIENCETM
checked on Jan 7, 2019
checked on Dec 21, 2018
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.