Please use this identifier to cite or link to this item: https://doi.org/10.1007/s00339-004-3197-6
Title: Sputtered deposited nanocrystalline ZnO films: A correlation between electrical, optical and microstructural properties
Authors: Lee, J.
Gao, W.
Li, Z.
Hodgson, M.
Metson, J.
Gong, H. 
Pal, U.
Issue Date: May-2005
Citation: Lee, J., Gao, W., Li, Z., Hodgson, M., Metson, J., Gong, H., Pal, U. (2005-05). Sputtered deposited nanocrystalline ZnO films: A correlation between electrical, optical and microstructural properties. Applied Physics A: Materials Science and Processing 80 (8) : 1641-1646. ScholarBank@NUS Repository. https://doi.org/10.1007/s00339-004-3197-6
Abstract: Zinc oxide thin films were prepared by dc (direct current) and rf (radio frequency) magnetron sputtering on glass substrates. ZnO films produced by dc sputtering have a high resistance, while the films produced using rf sputtering are significantly more conductive. While the conductive films have a compact nodular surface morphology, the resistive films have a relatively porous surface with columnar structures in cross section. Compared to the dc sputtered films, rf sputtered films have a microstructure with smaller d spacing, lower internal stress, higher band gap energy and higher density. Dependence of conductivity on the deposition technique and the resulting d spacing, stress, density, band gap, film thickness and Al doping are discussed. Correlations between the electrical conductivity, microstructural parameters and optical properties of the films have been made. © Springer-Verlag 2004.
Source Title: Applied Physics A: Materials Science and Processing
URI: http://scholarbank.nus.edu.sg/handle/10635/107195
ISSN: 09478396
DOI: 10.1007/s00339-004-3197-6
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