Please use this identifier to cite or link to this item: http://scholarbank.nus.edu.sg/handle/10635/107016
Title: Effect of temperature on electrochemical behavior for Cu-Al-O coatings prepared by CVD
Authors: Yizhong, H.
Yue, W. 
Blackwood, D.J. 
Issue Date: Sep-2000
Source: Yizhong, H.,Yue, W.,Blackwood, D.J. (2000-09). Effect of temperature on electrochemical behavior for Cu-Al-O coatings prepared by CVD. Vacuum 58 (4) : 586-593. ScholarBank@NUS Repository.
Abstract: The electrochemical behavior of two kinds of Cu-Al-O coatings prepared by CVD at different temperatures was monitored anodically and cathodically in a solution of 0.1 M NaCl. The results show that the coating achieved at 700 °C has lower resistance against anodic polarization than the coating achieved at 800 °C. Alternatively, the former exhibits rather higher susceptibility to hydrogen evolution than the latter. The atomic hydrogen evolves at the surface of the coating and penetrates deeply into the coating resulting in initiation of hydrogen bubbles. With the increase of hydrogen pressure in bubbles, they grow continuously leading to hydrogen-induced cracking ultimately at the moment when the hydrogen pressure reaches a critical value. Essentially, the susceptibility of hydrogen-induced cracking for coatings should be attributed to the temperature that prevailed during CVD. Higher temperature can evidently enhance the resistance against hydrogen-induced cracking.
Source Title: Vacuum
URI: http://scholarbank.nus.edu.sg/handle/10635/107016
ISSN: 0042207X
Appears in Collections:Staff Publications

Show full item record
Files in This Item:
There are no files associated with this item.

Page view(s)

12
checked on Feb 16, 2018

Google ScholarTM

Check


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.