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https://doi.org/10.1016/S0927-7757(99)00444-6
Title: | Series expansion and computer simulation studies of random sequential adsorption | Authors: | Wang, J.-S. | Keywords: | Deposition Lattice site Particle relaxation Random sequential adsorption |
Issue Date: | 30-May-2000 | Citation: | Wang, J.-S. (2000-05-30). Series expansion and computer simulation studies of random sequential adsorption. Colloids and Surfaces A: Physicochemical and Engineering Aspects 165 (1-3) : 325-343. ScholarBank@NUS Repository. https://doi.org/10.1016/S0927-7757(99)00444-6 | Abstract: | We discuss two important techniques; series expansion and Monte Carlo simulation, for a random sequential adsorption study. Random sequential adsorption is an idealization for surface deposition where the time scale of particle relaxation is much longer than the time scale of deposition. Particles are represented as extended objects which are adsorbed onto a continuum surface or lattice sites. Once landed on the surface, the particles stick to the surface. We review in some detail, various methods of computing the coverage θ(t) and present some of the recent and new results in random sequential adsorption. (C) 2000 Elsevier Science B.V. | Source Title: | Colloids and Surfaces A: Physicochemical and Engineering Aspects | URI: | http://scholarbank.nus.edu.sg/handle/10635/104857 | ISSN: | 09277757 | DOI: | 10.1016/S0927-7757(99)00444-6 |
Appears in Collections: | Staff Publications |
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