Please use this identifier to cite or link to this item: https://doi.org/10.1016/S0927-7757(99)00444-6
Title: Series expansion and computer simulation studies of random sequential adsorption
Authors: Wang, J.-S. 
Keywords: Deposition
Lattice site
Particle relaxation
Random sequential adsorption
Issue Date: 30-May-2000
Citation: Wang, J.-S. (2000-05-30). Series expansion and computer simulation studies of random sequential adsorption. Colloids and Surfaces A: Physicochemical and Engineering Aspects 165 (1-3) : 325-343. ScholarBank@NUS Repository. https://doi.org/10.1016/S0927-7757(99)00444-6
Abstract: We discuss two important techniques; series expansion and Monte Carlo simulation, for a random sequential adsorption study. Random sequential adsorption is an idealization for surface deposition where the time scale of particle relaxation is much longer than the time scale of deposition. Particles are represented as extended objects which are adsorbed onto a continuum surface or lattice sites. Once landed on the surface, the particles stick to the surface. We review in some detail, various methods of computing the coverage θ(t) and present some of the recent and new results in random sequential adsorption. (C) 2000 Elsevier Science B.V.
Source Title: Colloids and Surfaces A: Physicochemical and Engineering Aspects
URI: http://scholarbank.nus.edu.sg/handle/10635/104857
ISSN: 09277757
DOI: 10.1016/S0927-7757(99)00444-6
Appears in Collections:Staff Publications

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