Ion beam lithography and nanofabrication: A review

Abstract

The ion beam lithography techniques which have potential applications in nanofabrication are discussed. The three ion beam techniques, focused ion beam (FIB), proton beam writing and ion projection lithography (IPL), have overcome the technological difficulties and are capable of fabricating structures at the nanoscale. The FIB and IPL may have some distinct advantages when used in combination with nanoimprinting and pattern transfer. FIB can produce master stamps in any material, and proton beam writing is ideal for producing three-dimensional high-aspect ratio metallic stamps of precise geometry.