Please use this identifier to cite or link to this item: https://doi.org/10.1142/S0219581X05003139
Title: Ion beam lithography and nanofabrication: A review
Authors: Watt, F. 
Bettiol, A.A. 
Van Kan, J.A. 
Teo, E.J. 
Breese, M.B.H. 
Keywords: Focused ion beam
Ion beam lithography
Ion projection lithography
Nanofabrication
Proton beam writing
Issue Date: Jun-2005
Citation: Watt, F., Bettiol, A.A., Van Kan, J.A., Teo, E.J., Breese, M.B.H. (2005-06). Ion beam lithography and nanofabrication: A review. International Journal of Nanoscience 4 (3) : 269-286. ScholarBank@NUS Repository. https://doi.org/10.1142/S0219581X05003139
Abstract: The ion beam lithography techniques which have potential applications in nanofabrication are discussed. The three ion beam techniques, focused ion beam (FIB), proton beam writing and ion projection lithography (IPL), have overcome the technological difficulties and are capable of fabricating structures at the nanoscale. The FIB and IPL may have some distinct advantages when used in combination with nanoimprinting and pattern transfer. FIB can produce master stamps in any material, and proton beam writing is ideal for producing three-dimensional high-aspect ratio metallic stamps of precise geometry.
Source Title: International Journal of Nanoscience
URI: http://scholarbank.nus.edu.sg/handle/10635/99009
ISSN: 0219581X
DOI: 10.1142/S0219581X05003139
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