Please use this identifier to cite or link to this item:
|Title:||Ion beam lithography and nanofabrication: A review||Authors:||Watt, F.
Van Kan, J.A.
|Keywords:||Focused ion beam
Ion beam lithography
Ion projection lithography
Proton beam writing
|Issue Date:||Jun-2005||Citation:||Watt, F., Bettiol, A.A., Van Kan, J.A., Teo, E.J., Breese, M.B.H. (2005-06). Ion beam lithography and nanofabrication: A review. International Journal of Nanoscience 4 (3) : 269-286. ScholarBank@NUS Repository. https://doi.org/10.1142/S0219581X05003139||Abstract:||The ion beam lithography techniques which have potential applications in nanofabrication are discussed. The three ion beam techniques, focused ion beam (FIB), proton beam writing and ion projection lithography (IPL), have overcome the technological difficulties and are capable of fabricating structures at the nanoscale. The FIB and IPL may have some distinct advantages when used in combination with nanoimprinting and pattern transfer. FIB can produce master stamps in any material, and proton beam writing is ideal for producing three-dimensional high-aspect ratio metallic stamps of precise geometry.||Source Title:||International Journal of Nanoscience||URI:||http://scholarbank.nus.edu.sg/handle/10635/99009||ISSN:||0219581X||DOI:||10.1142/S0219581X05003139|
|Appears in Collections:||Staff Publications|
Show full item record
Files in This Item:
There are no files associated with this item.
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.