Resist evaluation for Ni mold fabrication and proton beam writing

Abstract

In our experiments, we use different photoresists for proton beam writing and mold fabrication. We have fabricated Ni mold with structures down to 500 nm. We first use a fine focused proton beam to expose different photoresists, Polymethyl Methacrylate (PMMA), AR-P 3250 and ma-N 2410. After development and nickel sulfamate electroplating, the structures were faithfully transferred from the photoresists to Ni molds. © 2011 Elsevier B.V. All rights reserved.