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Please use this identifier to cite or link to this item: https://doi.org/10.1109/IMNC.2007.4456283
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dc.titleRealization and simulation of high aspect ratio micro/nano structures by proton beam writing
dc.contributor.authorChatzichristidi, M.
dc.contributor.authorValamontes, E.
dc.contributor.authorRaptis, I.
dc.contributor.authorVan Kan, J.A.
dc.contributor.authorWatt, F.
dc.date.accessioned2014-10-16T09:52:23Z
dc.date.available2014-10-16T09:52:23Z
dc.date.issued2007
dc.identifier.citationChatzichristidi, M.,Valamontes, E.,Raptis, I.,Van Kan, J.A.,Watt, F. (2007). Realization and simulation of high aspect ratio micro/nano structures by proton beam writing. Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC : 420-421. ScholarBank@NUS Repository. <a href="https://doi.org/10.1109/IMNC.2007.4456283" target="_blank">https://doi.org/10.1109/IMNC.2007.4456283</a>
dc.identifier.isbn4990247248
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/98866
dc.description.abstractThe application of PBW on aqueous developable - easy stripping negative chemically amplified resist is shown. Resist structures with 280nm linewidth and aspect ratio of 40 were easily resolved. Further process optimization, for higher aspect ratio resist structures at the nanoscale is under way. Complementary metallic structures will be resolved by electroplating and resist stripping. The development/integration of the PBW simulation software is in progress.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1109/IMNC.2007.4456283
dc.sourceScopus
dc.typeConference Paper
dc.contributor.departmentPHYSICS
dc.description.doi10.1109/IMNC.2007.4456283
dc.description.sourcetitleDigest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC
dc.description.page420-421
dc.identifier.isiutNOT_IN_WOS
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