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|Title:||Novel types of silicon waveguides fabricated using proton beam irradiation||Authors:||Teo, E.J.
|Issue Date:||2010||Citation:||Teo, E.J., Yang, P., Xiong, B.Q., Breese, M.B.H., Mashanovich, G.Z., Ow, Y.S., Reed, G.T., Bettiol, A.A. (2010). Novel types of silicon waveguides fabricated using proton beam irradiation. Proceedings of SPIE - The International Society for Optical Engineering 7606 : -. ScholarBank@NUS Repository. https://doi.org/10.1117/12.841536||Abstract:||In this work, we describe the use of a combination of proton beam irradiation and electrochemical etching to fabricate high index-contrast waveguides directly in silicon without the need for silicon-on-insulator substrate. Various types of waveguides with air or porous silicon cladding have been demonstrated. We show that porous silicon (PS) is a flexible cladding material due to the tunability of its refractive index and thickness. The Si/PS waveguide system also possesses better transmittance in the ranges of 1.2-9 and 23-200 μm, compared to Si/SiO2 waveguides. This is potentially important for mid and far-IR applications. Since it is compatible with conventional CMOS technology, this process can be used for fabrication of integrated optoelectronics circuits. © 2010 Copyright SPIE - The International Society for Optical Engineering.||Source Title:||Proceedings of SPIE - The International Society for Optical Engineering||URI:||http://scholarbank.nus.edu.sg/handle/10635/98818||ISBN:||9780819480026||ISSN:||0277786X||DOI:||10.1117/12.841536|
|Appears in Collections:||Staff Publications|
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