Please use this identifier to cite or link to this item:
Title: Novel types of silicon waveguides fabricated using proton beam irradiation
Authors: Teo, E.J. 
Yang, P.
Xiong, B.Q.
Breese, M.B.H. 
Mashanovich, G.Z.
Ow, Y.S. 
Reed, G.T.
Bettiol, A.A. 
Keywords: Electrochemical etching
Porous silicon
Silicon photonics
Issue Date: 2010
Citation: Teo, E.J., Yang, P., Xiong, B.Q., Breese, M.B.H., Mashanovich, G.Z., Ow, Y.S., Reed, G.T., Bettiol, A.A. (2010). Novel types of silicon waveguides fabricated using proton beam irradiation. Proceedings of SPIE - The International Society for Optical Engineering 7606 : -. ScholarBank@NUS Repository.
Abstract: In this work, we describe the use of a combination of proton beam irradiation and electrochemical etching to fabricate high index-contrast waveguides directly in silicon without the need for silicon-on-insulator substrate. Various types of waveguides with air or porous silicon cladding have been demonstrated. We show that porous silicon (PS) is a flexible cladding material due to the tunability of its refractive index and thickness. The Si/PS waveguide system also possesses better transmittance in the ranges of 1.2-9 and 23-200 μm, compared to Si/SiO2 waveguides. This is potentially important for mid and far-IR applications. Since it is compatible with conventional CMOS technology, this process can be used for fabrication of integrated optoelectronics circuits. © 2010 Copyright SPIE - The International Society for Optical Engineering.
Source Title: Proceedings of SPIE - The International Society for Optical Engineering
ISBN: 9780819480026
ISSN: 0277786X
DOI: 10.1117/12.841536
Appears in Collections:Staff Publications

Show full item record
Files in This Item:
There are no files associated with this item.

Page view(s)

checked on Jun 27, 2020

Google ScholarTM



Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.