Please use this identifier to cite or link to this item:
|Title:||Influence of sputtering gas pressure on high-frequency soft magnetic properties of FeCoN thin film||Authors:||Xu, F.
soft magnetic thin film
|Issue Date:||Oct-2011||Citation:||Xu, F., Liao, Z., Huang, Q., Ong, C.K., Li, S. (2011-10). Influence of sputtering gas pressure on high-frequency soft magnetic properties of FeCoN thin film. IEEE Transactions on Magnetics 47 (10) : 3921-3923. ScholarBank@NUS Repository. https://doi.org/10.1109/TMAG.2011.2151834||Abstract:||In this paper, the influences of sputtering gas pressure on the high-frequency soft magnetic properties of FeCoN thin films are investigated. Both the static soft magnetic properties and microwave characteristics of FeCoN thin films are found to be highly dependent on the pressure. The high-frequency magnetic properties are characterized with permeability spectra and discussed based on the Landau-Lifshitz-Gilbert equation. The damping factor changes with sputtering gas pressure, and the resonance frequency shows an extraordinary large tunability with sputtering gas pressure. The effects are suggested to be related to the film stress which is affected by the sputtering pressure. This work provides a convenient method to tune the high-frequency magnetic properties of FeCoN film. © 2011 IEEE.||Source Title:||IEEE Transactions on Magnetics||URI:||http://scholarbank.nus.edu.sg/handle/10635/98757||ISSN:||00189464||DOI:||10.1109/TMAG.2011.2151834|
|Appears in Collections:||Staff Publications|
Show full item record
Files in This Item:
There are no files associated with this item.
checked on Apr 5, 2020
WEB OF SCIENCETM
checked on Mar 25, 2020
checked on Mar 28, 2020
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.