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https://doi.org/10.1016/j.mee.2012.05.020
DC Field | Value | |
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dc.title | Fabrication of nickel molds using proton beam writing for micro/nano fluidic devices | |
dc.contributor.author | Liu, F. | |
dc.contributor.author | Tan, K.B. | |
dc.contributor.author | Malar, P. | |
dc.contributor.author | Bikkarolla, S.K. | |
dc.contributor.author | Van Kan, J.A. | |
dc.date.accessioned | 2014-10-16T09:50:26Z | |
dc.date.available | 2014-10-16T09:50:26Z | |
dc.date.issued | 2013-02 | |
dc.identifier.citation | Liu, F., Tan, K.B., Malar, P., Bikkarolla, S.K., Van Kan, J.A. (2013-02). Fabrication of nickel molds using proton beam writing for micro/nano fluidic devices. Microelectronic Engineering 102 : 36-39. ScholarBank@NUS Repository. https://doi.org/10.1016/j.mee.2012.05.020 | |
dc.identifier.issn | 01679317 | |
dc.identifier.uri | http://scholarbank.nus.edu.sg/handle/10635/98707 | |
dc.description.abstract | In this paper, we present the fabrication of micro/nano fluidic devices with the combination of proton beam writing and UV lithography. Proton beam writing was used to generate the fine features with smooth sidewall profiles on ma-N resist, 110 and 600 nm thick. UV lithography is used to fabricate the micron sized feeding channels properly aligned with the nanostructures on ma-P resist. To get a durable mold, we need to transfer the resist structure into a nickel mold. Nickel electroplating and re-electroplating have been carried out to replicate the polymer structure in a nickel mold with the desired geometry, resulting in a durable Ni master mold. Finally it is demonstrated that these Ni molds can be used to make high quality PDMS fluidic channels used for DNA lab on chip experiments. © 2011 Elsevier B.V. All rights reserved. | |
dc.description.uri | http://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1016/j.mee.2012.05.020 | |
dc.source | Scopus | |
dc.subject | DNA analysis | |
dc.subject | Nickel molds | |
dc.subject | Proton beam writing | |
dc.type | Conference Paper | |
dc.contributor.department | PHYSICS | |
dc.description.doi | 10.1016/j.mee.2012.05.020 | |
dc.description.sourcetitle | Microelectronic Engineering | |
dc.description.volume | 102 | |
dc.description.page | 36-39 | |
dc.description.coden | MIENE | |
dc.identifier.isiut | 000312232300011 | |
Appears in Collections: | Staff Publications |
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