Fabrication of micro-optical components in polymer using proton beam writing

Abstract

Proton beam writing is a new direct write lithographic technique that utilizes a high energy (MeV) submicron focused proton beam to machine or modify a material, usually a polymer. Structures made using p-beam writing have very smooth side walls, high aspect ratio, and a scale that can be easily matched to existing optical fiber technology (0.1 to 1000 μm). In this paper we demonstrate the use of proton beam writing for prototyping micro-optical components such as microlens arrays and gratings in positive and negative resist. The structures that are fabricated can be used for both rapid prototyping and for large scale replication with nanoimprint lithography.