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|Title:||Surface chemical states on LPCVD-grown 4H-SiC epilayers||Authors:||Wee, A.T.S.
|Issue Date:||Apr-1998||Citation:||Wee, A.T.S.,Li, K.,Tin, C.C. (1998-04). Surface chemical states on LPCVD-grown 4H-SiC epilayers. Applied Surface Science 126 (1-2) : 34-42. ScholarBank@NUS Repository.||Abstract:||A series of 4H-silicon carbide (SiC) epilayers grown on 4H-SiC substrates by low pressure chemical vapor deposition (LPCVD) with different silane (SiH4) to propane (C3H8) gas flow ratios were studied by angle resolved X-ray photoelectron spectroscopy (ARXPS) and atomic force microscopy (AFM). ARXPS revealed that the surfaces of the samples consisted of elemental Si, Si oxides (SiO2 and SiOx where x < 2) and unreacted C-H species, in addition to the stoichiometric SiC compound. Small amounts of elemental Si were also detected within the 4H-SiC epilayers. The surface thickness of the C-H overlayer showed a positive correlation with the C3H8 source flow, and comprised largely of unreacted C3H8 or its intermediate products such as C2H2 and C2H4. This C-H overlayer had an rms roughness of 0.4 ± 0.1 nm as determined by AFM. The roughness was independent of the Si:C source ratio. AFM analyses revealed numerous micro-scratches which were the polishing marks on the 4H-SiC substrate copied by the epilayers. © 1998 Elsevier Science B.V.||Source Title:||Applied Surface Science||URI:||http://scholarbank.nus.edu.sg/handle/10635/98127||ISSN:||01694332|
|Appears in Collections:||Staff Publications|
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