Please use this identifier to cite or link to this item: https://doi.org/10.1039/c3nr05502g
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dc.titleSub-30 nm thick plasmonic films and structures with ultralow loss
dc.contributor.authorTeo, E.J.
dc.contributor.authorToyoda, N.
dc.contributor.authorYang, C.
dc.contributor.authorWang, B.
dc.contributor.authorZhang, N.
dc.contributor.authorBettiol, A.A.
dc.contributor.authorTeng, J.H.
dc.date.accessioned2014-10-16T09:43:04Z
dc.date.available2014-10-16T09:43:04Z
dc.date.issued2014-03-21
dc.identifier.citationTeo, E.J., Toyoda, N., Yang, C., Wang, B., Zhang, N., Bettiol, A.A., Teng, J.H. (2014-03-21). Sub-30 nm thick plasmonic films and structures with ultralow loss. Nanoscale 6 (6) : 3243-3249. ScholarBank@NUS Repository. https://doi.org/10.1039/c3nr05502g
dc.identifier.issn20403364
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/98103
dc.description.abstractWe report an alternative method of producing sub-30 nm thick silver films and structures with ultralow loss using gas cluster ion beam irradiation (GCIB). We have direct evidence showing that scattering from grain boundaries and voids rather than surface roughness are the main mechanisms for the increase in loss with reducing thickness. Using GCIB irradiation, we demonstrate the ability to reduce these scattering effects simultaneously through nanoscale surface smoothing, increase in grain width and lower percolation threshold. Significant improvement in electrical and optical properties by up to 4 times is obtained, before deviation from bulk silver properties starts to occur at 12 nm. We show that this is an enabling technology that can be applied post fabrication to metallic films or lithographically patterned nanostructures for enhanced plasmonic performance, especially in the ultrathin regime. This journal is © The Royal Society of Chemistry.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1039/c3nr05502g
dc.sourceScopus
dc.typeArticle
dc.contributor.departmentPHYSICS
dc.description.doi10.1039/c3nr05502g
dc.description.sourcetitleNanoscale
dc.description.volume6
dc.description.issue6
dc.description.page3243-3249
dc.identifier.isiut000332604200031
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