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|Title:||Stamps for nanoimprint lithography fabricated by proton beam writing and nickel electroplating||Authors:||Ansari, K.
Van Kan, J.A.
|Issue Date:||1-Oct-2006||Citation:||Ansari, K., Van Kan, J.A., Bettiol, A.A., Watt, F. (2006-10-01). Stamps for nanoimprint lithography fabricated by proton beam writing and nickel electroplating. Journal of Micromechanics and Microengineering 16 (10) : 1967-1974. ScholarBank@NUS Repository. https://doi.org/10.1088/0960-1317/16/10/008||Abstract:||In the emerging fields of nanoscience and nanotechnology, the demands for low-cost and high-throughput nanolithographic techniques have increased. Nanoimprint lithography is considered as one of the candidates showing high potential for nanofabrication, and here we report a fabrication process that utilizes high-quality nickel stamps with micron features down to sub-100 nm, made using proton beam writing coupled with nickel sulfamate electroplating. The fabricated stamps have a high aspect ratio, with smooth and vertical sidewalls. Nanoindentation and atomic force microscopy (AFM) measurements of the features on the surface of the stamps indicate a hardness of 5 GPa and a sidewall roughness of 7 nm. The stamps have been used for nanoimprint lithography on polymethylmethacrylate (PMMA) substrates and the imprinted patterns show a high degree of reproducibility. © 2006 IOP Publishing Ltd.||Source Title:||Journal of Micromechanics and Microengineering||URI:||http://scholarbank.nus.edu.sg/handle/10635/98014||ISSN:||09601317||DOI:||10.1088/0960-1317/16/10/008|
|Appears in Collections:||Staff Publications|
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