Please use this identifier to cite or link to this item:
|Title:||Sputtered lithium nickel vanadium oxide (LiNiVO4) films: Chemical compositions, structural variations, target history, and anodic/cathodic electrochemical properties||Authors:||Reddy, M.V.
|Keywords:||Atomic force microscopy
|Issue Date:||15-Feb-2010||Citation:||Reddy, M.V., Levasseur, A. (2010-02-15). Sputtered lithium nickel vanadium oxide (LiNiVO4) films: Chemical compositions, structural variations, target history, and anodic/cathodic electrochemical properties. Journal of Electroanalytical Chemistry 639 (1-2) : 27-35. ScholarBank@NUS Repository. https://doi.org/10.1016/j.jelechem.2009.10.034||Abstract:||In this paper, we report the chemical compositional variations and target surface history of lithium nickel vanadate material during RF-magnetron sputtering. Amorphous films were characterized by nuclear methods [Rutherford backscattering spectroscopy (RBS) and nuclear reaction analysis (NRA)], Auger electron spectroscopy (AES), X-ray diffraction (XRD), scanning electron microscope (SEM), atomic force microscope (AFM), and high resolution transmission electron microscopy (HTEM) techniques. Various nanostructured/porous LiNiVO4 thin film materials were obtained, depending on the composition of films, total pressure, annealing temperatures, thickness and heating time. Optimum film composition was obtained with the sputtering parameters; oxygen partial pressure (Po2) = 10 mPa, total pressure of (PAr) = 1 Pa, Rf-power = 30 W. Cathodic and anodic electrochemical properties of LiNiVO4 films were evaluated by galvanostatic cycling at constant current and cyclic voltammetry electroanalytical techniques. Electrochemical performance of the LiNiVO4 film deliver a capacity of ∼780 mA hg-1 (10th cycle), potential range, 0.02-3.0 V (anodic), at a current rate, 75 μA cm-2. In the potential range 1.2-4.5 V, deliver a capacity of 280 mA hg-1, and in the potential window, 3.0-4.8 V (cathodic), 0.6 Li are removed from the host LiNiVO4 lattice. © 2009 Elsevier B.V. All rights reserved.||Source Title:||Journal of Electroanalytical Chemistry||URI:||http://scholarbank.nus.edu.sg/handle/10635/98005||ISSN:||15726657||DOI:||10.1016/j.jelechem.2009.10.034|
|Appears in Collections:||Staff Publications|
Show full item record
Files in This Item:
There are no files associated with this item.
checked on May 29, 2020
WEB OF SCIENCETM
checked on May 21, 2020
checked on May 10, 2020
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.