Please use this identifier to cite or link to this item:
Title: SIMS study of NO, CO adsorption on Cu(100) and Cu(210) surfaces
Authors: Wee, A.T.S. 
Lin, J. 
Huan, A.C.H. 
Loh, F.C. 
Tan, K.L. 
Issue Date: 1-Mar-1994
Citation: Wee, A.T.S.,Lin, J.,Huan, A.C.H.,Loh, F.C.,Tan, K.L. (1994-03-01). SIMS study of NO, CO adsorption on Cu(100) and Cu(210) surfaces. Surface Science 304 (1-2) : 145-158. ScholarBank@NUS Repository.
Abstract: The adsorption of NO and CO on Cu(100) and Cu(210) at 110 K and the subsequent desorption/reaction have been studied by static SIMS, and complemented by XPS. After NO and CO coadsorption at 110 K, the major adsorbates are found to be NO2, N2O4, NO, NO3, CO, N and O adatoms. The dissociative adsorption of NO to form N and O adatoms is strongly enhanced on the stepped Cu(210) surface. Most of the molecular species desorb by 200 K upon heating the adlayer. On the stepped surface only, the formation of the isocyanate (-NCO) intermediate is observed, and is deduced to form via the reaction of adsorbed CO and N adatoms at step sites. At higher temperatures (200-300 K) the isocyanate intermediate decomposes to a cyanide (-CN) species. © 1994.
Source Title: Surface Science
ISSN: 00396028
Appears in Collections:Staff Publications

Show full item record
Files in This Item:
There are no files associated with this item.

Page view(s)

checked on Apr 21, 2019

Google ScholarTM


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.