Please use this identifier to cite or link to this item: https://scholarbank.nus.edu.sg/handle/10635/97660
DC FieldValue
dc.titleQuantitative analysis of a-Si1 - XCx:H thin films
dc.contributor.authorGracin, D.
dc.contributor.authorJakšić, M.
dc.contributor.authorYang, C.
dc.contributor.authorBorjanović, V.
dc.contributor.authorPraček, B.
dc.date.accessioned2014-10-16T09:37:50Z
dc.date.available2014-10-16T09:37:50Z
dc.date.issued1999-04
dc.identifier.citationGracin, D.,Jakšić, M.,Yang, C.,Borjanović, V.,Praček, B. (1999-04). Quantitative analysis of a-Si1 - XCx:H thin films. Applied Surface Science 144-145 (0) : 188-191. ScholarBank@NUS Repository.
dc.identifier.issn01694332
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/97660
dc.description.abstractThe composition of a-Si1 - xCx:H films, deposited by magnetron sputtering, was measured by AES (Auger Electron Spectroscopy), RBS (Rutherford Backscattering Spectrometry) using both, protons and α-particles, ERDA (Elastic Recoil Detection Analysis) and FTIR spectroscopy. The results obtained by all three methods show agreement in CC/CSi ratio within the experimental error. However, the AES somewhat underestimates the silicon concentrations, which is discussed as a consequence of chemical bonding and matrix effects. The hydrogen concentrations obtained by ERDA are typically about 30% higher than those estimated by FTIR, possibly due to the presence of non-bonded hydrogen in the film. © 1999 Elsevier Science B.V. All rights reserved.
dc.sourceScopus
dc.subjectAmorphous films
dc.subjectAuger spectroscopy
dc.subjectBackscattering
dc.subjectCarbon content
dc.subjectFTIR spectroscopy
dc.subjectHydrogen content
dc.typeArticle
dc.contributor.departmentPHYSICS
dc.description.sourcetitleApplied Surface Science
dc.description.volume144-145
dc.description.issue0
dc.description.page188-191
dc.description.codenASUSE
dc.identifier.isiutNOT_IN_WOS
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