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|Title:||Photoelectron emission and Raman scattering studies of nitrogenated tetrahedral amorphous carbon films||Authors:||Shi, J.R.
|Issue Date:||15-Nov-2002||Citation:||Shi, J.R., Wang, J.P., Wee, A.T.S., Yeo, C.B., Cheng, C.T., Ueda, M., Tomioka, S., Ohsako, J. (2002-11-15). Photoelectron emission and Raman scattering studies of nitrogenated tetrahedral amorphous carbon films. Journal of Applied Physics 92 (10) : 5966-5970. ScholarBank@NUS Repository. https://doi.org/10.1063/1.1512963||Abstract:||Nitrogenated tetrahedral amorphous carbon (N:ta-C) films prepared by the filtered cathodic vacuum arc technique were studied by x-ray photoelectron spectroscopy (XPS), Raman spectroscopy, spectroscopic ellipsometry, ultraviolet photoelectron spectroscopy and temperature dependent resistance measurement. As the nitrogen flow rate varies from 0 to 20 sccm, the nitrogen content in the deposited film increases from 0 to 4.6 at.%. Curve fitting of the C 1s and N 1s XPS spectra shows that the C-C sp 3 fraction decreases with an increase in nitrogen content and that the nitrogen atoms are mainly bonded in sp 2 C-N bonds. The pure ta-C film has a work function of 4.35 eV and the N:ta-C films have a value around 4.55 eV. With an increase in nitrogen flow rate, the intensity ratio of the D peak to the G peak, I D/I G increases monotonously from 0.44 to 1.25 and the G peak width decreases from 220 to 199 cm -1. The Tauc optical band gap decreases from 2.2 to 1.8 eV. © 2002 American Institute of Physics. © 2002 American Institute of Physics.||Source Title:||Journal of Applied Physics||URI:||http://scholarbank.nus.edu.sg/handle/10635/97534||ISSN:||00218979||DOI:||10.1063/1.1512963|
|Appears in Collections:||Staff Publications|
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