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|Title:||Fabrication of low-loss silicon-on-oxidized-porous-silicon strip waveguide using focused proton-beam irradiation||Authors:||Teo, E.J.
|Issue Date:||1-Mar-2009||Citation:||Teo, E.J., Bettiol, A.A., Yang, P., Breese, M.B.H., Xiong, B.Q., Mashanovich, G.Z., Headley, W.R., Reed, G.T. (2009-03-01). Fabrication of low-loss silicon-on-oxidized-porous-silicon strip waveguide using focused proton-beam irradiation. Optics Letters 34 (5) : 659-661. ScholarBank@NUS Repository. https://doi.org/10.1364/OL.34.000659||Abstract:||We have successfully fabricated low-loss silicon-on-oxidized-porous-silicon (SOPS) strip waveguides with high-index contrast using focused proton-beam irradiation and electrochemical etching. Smooth surface quality with rms roughness of 3.1 nm is achieved for a fluence of 1× 1015/ cm2 after postoxidation treatment. Optical characterization at a wavelength of 1550 nm shows a loss of 1.1±0.4 dB/cm and 1.2±0.4 dB/cm in TE and TM polarization respectively, which we believe is the lowest reported loss for SOPS waveguides. This opens up new opportunities for all-silicon-based optoelectronics applications. © 2009 Optical Society of America.||Source Title:||Optics Letters||URI:||http://scholarbank.nus.edu.sg/handle/10635/96597||ISSN:||01469592||DOI:||10.1364/OL.34.000659|
|Appears in Collections:||Staff Publications|
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