Fabrication of high aspect ratio 100 nm metallic stamps for nanoimprint lithography using proton beam writing

Abstract

The fabrication method of high-quality void-free high aspect ratio 100 nm metallic stamps for nanoimprint lithography using proton beam writing (PBW) was discussed. Nanoimprinting was carried out with a commercial nanoimprinter using 8-μm-thick poly(methymethacrylate) (PMMA) resist in anisole double spin coated on Cu(200 nm)/Ti(20 nm)/Si substrate. It was suggested that PBW coupled with electroplating offers a process of high potential for the fabrication of high quality metallic 3D nanostamps. It was also suggested that since proton beam writing exhibits minimal proximity effects, it is ideally suited to produce features of high packing density.