Please use this identifier to cite or link to this item: https://doi.org/10.1016/j.susc.2011.06.023
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dc.titleEvidence for the interfacial reaction between Ni adatoms and H-Si(001) surface
dc.contributor.authorZhang, Z.
dc.contributor.authorPan, J.S.
dc.contributor.authorChai, J.W.
dc.contributor.authorZhang, J.
dc.contributor.authorTok, E.S.
dc.date.accessioned2014-10-16T09:24:29Z
dc.date.available2014-10-16T09:24:29Z
dc.date.issued2011-10
dc.identifier.citationZhang, Z., Pan, J.S., Chai, J.W., Zhang, J., Tok, E.S. (2011-10). Evidence for the interfacial reaction between Ni adatoms and H-Si(001) surface. Surface Science 605 (19-20) : 1852-1860. ScholarBank@NUS Repository. https://doi.org/10.1016/j.susc.2011.06.023
dc.identifier.issn00396028
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/96529
dc.description.abstractHydrogen termination of Si surfaces (H-Si) does not stop the interfacial reaction between Ni adatoms and H-Si(001) surface at room temperature. At low Ni coverage of 0.1% (equivalent to 0.02 ML), X-ray photoelectron spectroscopy (XPS) reveals a binding energy shift of Ni 2p3/2 to 854.0 eV, which corresponds to the formation a NiSi-like environment. As the coverage of Ni increases, the Ni 2p3/2 eventually shifts to 852.8 eV, indicative of formation of metallic Ni. XPS intensity vs Ni coverage analysis reveals a growth process akin to pseudo-layer-by-layer growth mode, thereby suggesting the formation of bulk-Si(001)/NiSi-like/Ni-rich-silicide-like/metallic Ni structure as growth proceeds. For Ni coverage not more that 33% (equivalent to 12.68 ML), Ni remains protected by the silicide environment and no oxidation of Ni to form Ni-oxides was observed even after exposing the samples to air for 400 days. For samples with Ni coverage above 41%, oxidation of Ni is observed by presence of NiO and NiSiO3 peaks at 854.5 and 857.0 eV, respectively. The current studies suggest that there is reaction between Ni adatoms and Si at the growth front on H-Si(001) surfaces upon Ni deposition at room temperature and hydrogen termination does not suppress the interface reaction between Ni and Si. Copyright © 2011 Published by Elsevier B.V. All rights reserved.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1016/j.susc.2011.06.023
dc.sourceScopus
dc.subjectInterfacial reaction
dc.subjectNickel silicide
dc.subjectSilicon
dc.subjectX-ray photoelectron spectroscopy (XPS)
dc.typeArticle
dc.contributor.departmentPHYSICS
dc.description.doi10.1016/j.susc.2011.06.023
dc.description.sourcetitleSurface Science
dc.description.volume605
dc.description.issue19-20
dc.description.page1852-1860
dc.description.codenSUSCA
dc.identifier.isiut000294237600014
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