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Please use this identifier to cite or link to this item: https://scholarbank.nus.edu.sg/handle/10635/96342
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dc.titleEffect of surface structures upon ultrathin film interference fringes
dc.contributor.authorTaijing, Lu
dc.contributor.authorOgawa, Tomoya
dc.contributor.authorToyoda, Koichi
dc.contributor.authorWang, Zhenguo
dc.date.accessioned2014-10-16T09:22:19Z
dc.date.available2014-10-16T09:22:19Z
dc.date.issued1993
dc.identifier.citationTaijing, Lu,Ogawa, Tomoya,Toyoda, Koichi,Wang, Zhenguo (1993). Effect of surface structures upon ultrathin film interference fringes. Journal of Materials Research 8 (9) : 2315-2318. ScholarBank@NUS Repository.
dc.identifier.issn08842914
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/96342
dc.description.abstractEffect of surface structures upon ultrathin film interference fringes generated from extremely thin films or epitaxial layers grown on semiconductor wafers has been studied. Since dark regions of fringes correspond to the places where the thin films are destroyed or absent, the fringes are investigated to detect uneven surfaces with undesired structures. Therefore, surface microstructures can be detected and characterized effectively by the modification of the fringes.
dc.sourceScopus
dc.typeArticle
dc.contributor.departmentPHYSICS
dc.description.sourcetitleJournal of Materials Research
dc.description.volume8
dc.description.issue9
dc.description.page2315-2318
dc.description.codenJMREE
dc.identifier.isiutNOT_IN_WOS
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