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Title: Critical review of the current status of thickness measurements for ultrathin SiO 2 on Si Part V: Results of a CCQM pilot study
Authors: Seah, M.P.
Spencer, S.J.
Bensebaa, F.
Vickridge, I.
Danzebrink, H.
Krumrey, M.
Gross, T.
Oesterle, W.
Wendler, E.
Rheinländer, B.
Azuma, Y.
Kojima, I.
Suzuki, N.
Suzuki, M.
Tanuma, S.
Moon, D.W.
Lee, H.J.
Cho, H.M.
Chen, H.Y.
Wee, A.T.S. 
Osipowicz, T. 
Pan, J.S.
Jordaan, W.A.
Hauert, R.
Klotz, U.
Van Der Marel, C.
Verheijen, M.
Tamminga, Y.
Jeynes, C.
Bailey, P.
Biswas, S.
Falke, U.
Nguyen, N.V.
Chandler-Horowitz, D.
Ehrstein, J.R.
Muller, D.
Dura, J.A.
Keywords: Calibration
Gate oxides
Interlaboratory study
Neutron reflectometry
Silicon dioxide
Thickness measurement
Issue Date: Sep-2004
Citation: Seah, M.P., Spencer, S.J., Bensebaa, F., Vickridge, I., Danzebrink, H., Krumrey, M., Gross, T., Oesterle, W., Wendler, E., Rheinländer, B., Azuma, Y., Kojima, I., Suzuki, N., Suzuki, M., Tanuma, S., Moon, D.W., Lee, H.J., Cho, H.M., Chen, H.Y., Wee, A.T.S., Osipowicz, T., Pan, J.S., Jordaan, W.A., Hauert, R., Klotz, U., Van Der Marel, C., Verheijen, M., Tamminga, Y., Jeynes, C., Bailey, P., Biswas, S., Falke, U., Nguyen, N.V., Chandler-Horowitz, D., Ehrstein, J.R., Muller, D., Dura, J.A. (2004-09). Critical review of the current status of thickness measurements for ultrathin SiO 2 on Si Part V: Results of a CCQM pilot study. Surface and Interface Analysis 36 (9) : 1269-1303. ScholarBank@NUS Repository.
Abstract: A study was carried out for the measurement of ultrathin SiO 2 on (100) and (111) orientation silicon wafer in the thickness range 1.5-8 nm. XPS, medium-energy ion scattering spectrometry (MEIS), nuclear reaction analysis (NRA), RBS, elastic backscattering spectrometry (EBS), SIMS, ellipsometry, gazing-incidence x-ray reflectometry (GIXRR), neutron reflectometry and transmission electron microscopy (TEM) were used for the measurements. Water and carbonaceous contamination about 1 nm were observed by ellipsometry and adsorbed oxygen mainly from water at thickness of 0.5 nm were seen by MEIS, NRA, RBS and GIXRR. The different uncertainty of the techniques for the scaling constant were also discussed.
Source Title: Surface and Interface Analysis
ISSN: 01422421
DOI: 10.1002/sia.1909
Appears in Collections:Staff Publications

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