Please use this identifier to cite or link to this item: https://doi.org/10.1143/JJAP.45.2106
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dc.titleCobalt nanowire fabrication on activated nitrogen-templated Cu(210) surface
dc.contributor.authorXu, H.
dc.contributor.authorGao, X.
dc.contributor.authorSun, Y.Y.
dc.contributor.authorWee, A.T.S.
dc.date.accessioned2014-10-16T09:18:23Z
dc.date.available2014-10-16T09:18:23Z
dc.date.issued2006-03-27
dc.identifier.citationXu, H., Gao, X., Sun, Y.Y., Wee, A.T.S. (2006-03-27). Cobalt nanowire fabrication on activated nitrogen-templated Cu(210) surface. Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers 45 (3 B) : 2106-2110. ScholarBank@NUS Repository. https://doi.org/10.1143/JJAP.45.2106
dc.identifier.issn00214922
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/96004
dc.description.abstractWe have investigated self-organized cobalt nanowires grown on activated nitrogen (AN)-templated Cu(210) high index surface. The morphology and magnetic properties of the grown Co nanowires were studied by scanning tunneling microscopy (STM) and magneto-optic Kerr effect (MOKE), respectively. The chemical state of the nanowires formed was characterized by in-situ X-ray photoelectron spectroscopy (XPS). It was found that Co grew preferentially along the narrow chains induced by the AN to form periodic Co nanowire arrays with diameter of 10nm, which leads to a strong magnetic in-plane uniaxial anisotropy. Unlike the Co nanostructures formed on AN-modified low index Cu surfaces [Cu(100) and Cu(110)], these Co nanowires showed good thermal stability up to 470 °C, at which temperature the AN had desorbed from the surface. © 2006 The Japan Society of Applied Physics.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1143/JJAP.45.2106
dc.sourceScopus
dc.subjectCopper
dc.subjectHigh index surface
dc.subjectMagneto-optic Kerr effect (MOKE)
dc.subjectNitrogen
dc.subjectSelf-organized growth
dc.subjectSurface morphology scanning tunneling microscopy (STM)
dc.subjectX-ray photoelectron spectroscopy (XPS)
dc.typeArticle
dc.contributor.departmentPHYSICS
dc.description.doi10.1143/JJAP.45.2106
dc.description.sourcetitleJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
dc.description.volume45
dc.description.issue3 B
dc.description.page2106-2110
dc.description.codenJAPND
dc.identifier.isiut000236624100053
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