Please use this identifier to cite or link to this item:
|Title:||Chemical tuning of band alignments for metal gate/high- κ oxide interfaces||Authors:||Dong, Y.F.
|Issue Date:||2006||Citation:||Dong, Y.F., Wang, S.J., Feng, Y.P., Huan, A.C.H. (2006). Chemical tuning of band alignments for metal gate/high- κ oxide interfaces. Physical Review B - Condensed Matter and Materials Physics 73 (4) : -. ScholarBank@NUS Repository. https://doi.org/10.1103/PhysRevB.73.045302||Abstract:||We report a method for chemical tuning of band alignments for metal gate/high- κ oxide interfaces. A heterovalent metal interlayer was included between the metal gate electrode and high- κ oxide. Based on our first-principles calculations for NiZr O2 (001) interfaces, a tunability as wide as 2.8 eV can be achieved for the effective work function of metal gate on high- κ oxide which far exceeds the required tuning range. In addition, we found a simple linear relationship between the effective metal work function and the electronegativity of interlayer metal atom for most of the transition metals considered. The localized interfacial dipole was found to dominate the contribution to the formation of Schottky barrier heights at metal/dielectric oxide interfaces. © 2006 The American Physical Society.||Source Title:||Physical Review B - Condensed Matter and Materials Physics||URI:||http://scholarbank.nus.edu.sg/handle/10635/95984||ISSN:||10980121||DOI:||10.1103/PhysRevB.73.045302|
|Appears in Collections:||Staff Publications|
Show full item record
Files in This Item:
There are no files associated with this item.
checked on Mar 31, 2020
WEB OF SCIENCETM
checked on Mar 23, 2020
checked on Mar 29, 2020
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.