Please use this identifier to cite or link to this item:
https://doi.org/10.1016/j.mee.2007.04.050
DC Field | Value | |
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dc.title | Band engineering in the high-k dielectrics gate stacks | |
dc.contributor.author | Wang, S.J. | |
dc.contributor.author | Dong, Y.F. | |
dc.contributor.author | Feng, Y.P. | |
dc.contributor.author | Huan, A.C.H. | |
dc.date.accessioned | 2014-10-16T09:16:31Z | |
dc.date.available | 2014-10-16T09:16:31Z | |
dc.date.issued | 2007-09 | |
dc.identifier.citation | Wang, S.J., Dong, Y.F., Feng, Y.P., Huan, A.C.H. (2007-09). Band engineering in the high-k dielectrics gate stacks. Microelectronic Engineering 84 (9-10) : 2332-2335. ScholarBank@NUS Repository. https://doi.org/10.1016/j.mee.2007.04.050 | |
dc.identifier.issn | 01679317 | |
dc.identifier.uri | http://scholarbank.nus.edu.sg/handle/10635/95848 | |
dc.description.abstract | In this report, the band alignment related issues for high-k gate stacks have been discussed and the band engineering has been studied by combinational characterization of in-situ x-ray photoemission spectroscopy (XPS), high resolution transmission electron microscopy (HRTEM) and first-principles calculations based on density functional theory (DFT). The results show that band alignments at metal-gate/high-κ interfaces can be engineered to satisfy the application for CMOS devices through the interface structure-control. © 2007 Elsevier B.V. All rights reserved. | |
dc.description.uri | http://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1016/j.mee.2007.04.050 | |
dc.source | Scopus | |
dc.subject | Band alignment | |
dc.subject | High-k gate stacks | |
dc.subject | Interface | |
dc.subject | Metal gate | |
dc.type | Article | |
dc.contributor.department | PHYSICS | |
dc.description.doi | 10.1016/j.mee.2007.04.050 | |
dc.description.sourcetitle | Microelectronic Engineering | |
dc.description.volume | 84 | |
dc.description.issue | 9-10 | |
dc.description.page | 2332-2335 | |
dc.description.coden | MIENE | |
dc.identifier.isiut | 000247378600115 | |
Appears in Collections: | Staff Publications |
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