Please use this identifier to cite or link to this item: https://doi.org/10.1016/j.mee.2007.04.050
DC FieldValue
dc.titleBand engineering in the high-k dielectrics gate stacks
dc.contributor.authorWang, S.J.
dc.contributor.authorDong, Y.F.
dc.contributor.authorFeng, Y.P.
dc.contributor.authorHuan, A.C.H.
dc.date.accessioned2014-10-16T09:16:31Z
dc.date.available2014-10-16T09:16:31Z
dc.date.issued2007-09
dc.identifier.citationWang, S.J., Dong, Y.F., Feng, Y.P., Huan, A.C.H. (2007-09). Band engineering in the high-k dielectrics gate stacks. Microelectronic Engineering 84 (9-10) : 2332-2335. ScholarBank@NUS Repository. https://doi.org/10.1016/j.mee.2007.04.050
dc.identifier.issn01679317
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/95848
dc.description.abstractIn this report, the band alignment related issues for high-k gate stacks have been discussed and the band engineering has been studied by combinational characterization of in-situ x-ray photoemission spectroscopy (XPS), high resolution transmission electron microscopy (HRTEM) and first-principles calculations based on density functional theory (DFT). The results show that band alignments at metal-gate/high-κ interfaces can be engineered to satisfy the application for CMOS devices through the interface structure-control. © 2007 Elsevier B.V. All rights reserved.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1016/j.mee.2007.04.050
dc.sourceScopus
dc.subjectBand alignment
dc.subjectHigh-k gate stacks
dc.subjectInterface
dc.subjectMetal gate
dc.typeArticle
dc.contributor.departmentPHYSICS
dc.description.doi10.1016/j.mee.2007.04.050
dc.description.sourcetitleMicroelectronic Engineering
dc.description.volume84
dc.description.issue9-10
dc.description.page2332-2335
dc.description.codenMIENE
dc.identifier.isiut000247378600115
Appears in Collections:Staff Publications

Show simple item record
Files in This Item:
There are no files associated with this item.

SCOPUSTM   
Citations

2
checked on Apr 12, 2021

WEB OF SCIENCETM
Citations

1
checked on Apr 12, 2021

Page view(s)

129
checked on Apr 11, 2021

Google ScholarTM

Check

Altmetric


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.