Please use this identifier to cite or link to this item: https://doi.org/10.1103/PhysRevB.74.195335
DC FieldValue
dc.titleAdsorption and diffusion of Co on the Si(001) surface
dc.contributor.authorPeng, G.W.
dc.contributor.authorHuan, A.C.H.
dc.contributor.authorTok, E.S.
dc.contributor.authorFeng, Y.P.
dc.date.accessioned2014-10-16T09:15:10Z
dc.date.available2014-10-16T09:15:10Z
dc.date.issued2006
dc.identifier.citationPeng, G.W.,Huan, A.C.H.,Tok, E.S.,Feng, Y.P. (2006). Adsorption and diffusion of Co on the Si(001) surface. Physical Review B - Condensed Matter and Materials Physics 74 (19) : -. ScholarBank@NUS Repository. <a href="https://doi.org/10.1103/PhysRevB.74.195335" target="_blank">https://doi.org/10.1103/PhysRevB.74.195335</a>
dc.identifier.issn10980121
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/95731
dc.description.abstractFirst-principles methods are employed to investigate the adsorption and diffusion of Co on Si(001). After determining the surface and subsurface binding sites, the nudged elastic band calculations are performed to explore the surface diffusion and the inward diffusion from the surface into the subsurface for Co on Si(001). It is found that Co atoms diffuse quickly to the subsurface from the surface, while the surface diffusion is slower. At low coverage, our calculations predict that Co atoms will be mainly found underneath the surface Si layer, which is in agreement with experimental results. The diffusion coefficients for Co diffusion into the subsurface are also calculated and compared with experimental results. © 2006 The American Physical Society.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1103/PhysRevB.74.195335
dc.sourceScopus
dc.typeArticle
dc.contributor.departmentPHYSICS
dc.description.doi10.1103/PhysRevB.74.195335
dc.description.sourcetitlePhysical Review B - Condensed Matter and Materials Physics
dc.description.volume74
dc.description.issue19
dc.description.page-
dc.description.codenPRBMD
dc.identifier.isiutNOT_IN_WOS
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