Please use this identifier to cite or link to this item: https://doi.org/10.1088/0268-1242/17/7/310
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dc.titleA Brillouin scattering study of the effect of chemical passivation on the elastic properties of porous silicon
dc.contributor.authorFan, H.J.
dc.contributor.authorKuok, M.H.
dc.contributor.authorNg, S.C.
dc.contributor.authorBoukherroub, R.
dc.contributor.authorLockwood, D.J.
dc.date.accessioned2014-10-16T09:13:38Z
dc.date.available2014-10-16T09:13:38Z
dc.date.issued2002-07
dc.identifier.citationFan, H.J., Kuok, M.H., Ng, S.C., Boukherroub, R., Lockwood, D.J. (2002-07). A Brillouin scattering study of the effect of chemical passivation on the elastic properties of porous silicon. Semiconductor Science and Technology 17 (7) : 692-695. ScholarBank@NUS Repository. https://doi.org/10.1088/0268-1242/17/7/310
dc.identifier.issn02681242
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/95603
dc.description.abstractBrillouin scattering has been performed to probe acoustic waves in porous silicon films that have been chemically modified with either 1-decene, decyl aldehyde, undecylenic acid, or ethyl undecylenate. The shift in the frequencies of acoustic modes in the passivated porous silicon samples, relative to those in freshly prepared porous silicon, is different for different chemical modifiers. The magnitude of the frequency shift is qualitatively correlated with the change, caused by the passivation, in the average densities and elastic constants of the samples.
dc.sourceScopus
dc.typeArticle
dc.contributor.departmentPHYSICS
dc.description.doi10.1088/0268-1242/17/7/310
dc.description.sourcetitleSemiconductor Science and Technology
dc.description.volume17
dc.description.issue7
dc.description.page692-695
dc.description.codenSSTEE
dc.identifier.isiut000177094900013
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