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Title: Thermal and photoinduced covalent attachment of 3-Chloro-1-propanol on Si(100)-2× 1
Authors: Shao, Y.X.
Dong, D.
Cai, Y.H.
Wang, S. 
Ang, S.G. 
Xu, G.Q. 
Issue Date: 14-Oct-2010
Citation: Shao, Y.X., Dong, D., Cai, Y.H., Wang, S., Ang, S.G., Xu, G.Q. (2010-10-14). Thermal and photoinduced covalent attachment of 3-Chloro-1-propanol on Si(100)-2× 1. Journal of Physical Chemistry C 114 (40) : 17159-17165. ScholarBank@NUS Repository.
Abstract: 3-Chloro-1-propanol (HO-CH2-CH2-CH2-Cl) covalently binds onto Si(100)-2× 1 through the thermal dissociation of the OH group to form Si-O-CH2-CH2-CH2-Cl surface intermediates, evidenced by the appearance of the Si-H stretching mode (2110 cm-1) and the retention of C-Cl stretching mode (654 cm-1) in the high-resolution electron energy loss spectroscopy (HREELS) spectrum of chemisorbed 3-chloro-1-propanol molecules and the chemical downshift of O1s binding energy (BE) in the X-ray photoelectron spectroscopy (XPS) study. The C-Cl bonds in the chemisorbed 3-chloro-1-propanol can be cleaved upon 193 nm irradiation, resulting in Si-O-CH2CH2CH 2-CH2CH2CH2-O-Si through lateral diradical coupling. Upon covering the chemisorbed 3-chloro-1-propanol with physisorbed molecules, photoinduced diradical coupling between physisorbed and chemisorbed molecules was also evidenced, achieving the secondary attachment of 3-chloro-1-propanol on the Si surface and forming Si-O-CH2CH 2CH2-CH2CH2CH2-OH. © 2010 American Chemical Society.
Source Title: Journal of Physical Chemistry C
ISSN: 19327447
DOI: 10.1021/jp103945m
Appears in Collections:Staff Publications

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