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Title: The dissociative adsorption of unsaturated alcohols on Si(1 1 1)-7×7
Authors: Tang, H.H.
Dai, Y.J.
Shao, Y.X.
Ning, Y.S.
Huang, J.Y.
Lai, Y.H. 
Peng, B.
Huang, W.
Xu, G.Q. 
Keywords: Alcohols
Density functional calculations
Electron energy loss spectroscopy (EELS)
Physical adsorption
Surface chemical reaction
X-ray photoelectron spectroscopy
Issue Date: 1-Aug-2008
Citation: Tang, H.H., Dai, Y.J., Shao, Y.X., Ning, Y.S., Huang, J.Y., Lai, Y.H., Peng, B., Huang, W., Xu, G.Q. (2008-08-01). The dissociative adsorption of unsaturated alcohols on Si(1 1 1)-7×7. Surface Science 602 (15) : 2647-2657. ScholarBank@NUS Repository.
Abstract: High-resolution electron energy loss spectroscopy (HREELS), X-ray photoelectron spectroscopy (XPS) and density functional theory (DFT) calculations were used to investigate the attachment of allyl and propargyl alcohols on Si(1 1 1)-7×7 under ultra-high vacuum conditions. The HREELS spectra of chemisorbed allyl alcohol (AA) show the concurrent appearance of characteristic stretching vibrations of Si-H (2104 cm-1) and Si-O (795 cm-1) coupled with the retention of vibrational features of C{double bond, long}C stretching (1657 cm-1) and (sp2)C-H stretching (3012 and 3102 cm-1). These results clearly demonstrate the dissociative reaction nature via the hydroxyl group for the chemisorption of AA on Si(1 1 1)-7×7, which was further supported by XPS and DFT studies. A similar reaction pathway was found for propargyl alcohol (PA) adsorbed on the same Si(1 1 1)-7×7 surface. Our studies suggest that OH dissociation is highly favorable compared to [2+2]-like cycloadditions via C{double bond, long}C/C{triple bond, long}C for organic reactions on silicon surfaces, which may be explained by the large spatial separation between the adjacent adatom-rest atom pair on Si(1 1 1)-7×7. © 2008 Elsevier B.V. All rights reserved.
Source Title: Surface Science
ISSN: 00396028
DOI: 10.1016/j.susc.2008.06.019
Appears in Collections:Staff Publications

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