Please use this identifier to cite or link to this item: https://doi.org/10.1016/j.chemphys.2004.04.005
DC FieldValue
dc.titleThe CN and CS transient species in CH3SCN discharges
dc.contributor.authorLi, P.
dc.contributor.authorTan, Y.L.
dc.contributor.authorFan, W.Y.
dc.date.accessioned2014-10-16T08:45:11Z
dc.date.available2014-10-16T08:45:11Z
dc.date.issued2004-07-12
dc.identifier.citationLi, P., Tan, Y.L., Fan, W.Y. (2004-07-12). The CN and CS transient species in CH3SCN discharges. Chemical Physics 302 (1-3) : 171-177. ScholarBank@NUS Repository. https://doi.org/10.1016/j.chemphys.2004.04.005
dc.identifier.issn03010104
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/95216
dc.description.abstractThe plasma chemistry of transient species in methyl thiocyanate (CH 3SCN) dc discharges was studied semi-quantitatively using spectroscopic techniques. The vibrational spectra of CS and CN diatomic species in these plasmas have been recorded using mid-infrared diode laser absorption spectroscopy (TDLAS). Concentrations of about 1012 and 10 13-1014 cm-3 were determined for CN and CS, respectively. It was also found that under high plasma current conditions, the concentration of ground state CN showed a decrease, while that of CS exhibited opposite behavior. The generation and loss of CN and CS were explained through a combination of key electron impact processes and radical-molecule reactions. One of the most abundant discharge products with a concentration of about 1015 cm-3 is isothiocyanic acid (HNCS) also detected using TDLAS. Surface as well as gas phase reactions contributed to its abundance in the plasma. Other species such as HCN and CS2 were detected with Fourier transform infrared spectroscopy, while the electronic emission spectra of CN, CS, CH, N2* and NH were also recorded using optical emission spectroscopy. © 2004 Elsevier B.V. All rights reserved.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1016/j.chemphys.2004.04.005
dc.sourceScopus
dc.subjectFree radicals
dc.subjectPlasma
dc.typeArticle
dc.contributor.departmentCHEMISTRY
dc.description.doi10.1016/j.chemphys.2004.04.005
dc.description.sourcetitleChemical Physics
dc.description.volume302
dc.description.issue1-3
dc.description.page171-177
dc.description.codenCMPHC
dc.identifier.isiut000222371000019
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