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|Title:||Photodegradation of poly(o-(trimethylsilyl)phenylacetylene) in solutions||Authors:||Neoh, K.G.
X-ray photoelectron spectroscopy
|Issue Date:||1991||Citation:||Neoh, K.G.,Kang, E.T.,Tan, K.L. (1991). Photodegradation of poly(o-(trimethylsilyl)phenylacetylene) in solutions. Polymer 32 (2) : 226-230. ScholarBank@NUS Repository.||Abstract:||Poly(o-(trimethylsilyl)phenylacetylene), poly(TMSPA) has been found to be highly stable in organic solvents in the absence of light and also in film form under ultra-violet/visible light irradiation. However, when poly(TMSPA) in chlorinated solvents is irradiated with ultra-violet and short-wavelength visible light, the polymer degrades and the rate of degradation is highest in the more highly chlorinated solvents such as CHCl3 and CCl4. After 2 h irradiation of a 2 × 10-3 M CCl4 solution the molecular weight of poly(TMSPA) may decrease by almost two orders of magnitude. Ultra-violet/visible absorption spectroscopy suggests the presence of charge-transfer interaction between CHCl3 and CH2Cl2 with the poly(TMSPA) after irradiation. X-ray photoelectron spectroscopy results indicate that chlorine is incorporated into the polymer during the degradation process. © 1991.||Source Title:||Polymer||URI:||http://scholarbank.nus.edu.sg/handle/10635/91631||ISSN:||00323861|
|Appears in Collections:||Staff Publications|
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