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Title: | Corrosion protection of copper by a self-assembled monolayer of alkanethiol | Authors: | Feng, Y. Teo, W.-K. Siow, K.-S. Gao, Z. Tan, K.-L. Hsieh, A.-K. |
Issue Date: | Jan-1997 | Citation: | Feng, Y.,Teo, W.-K.,Siow, K.-S.,Gao, Z.,Tan, K.-L.,Hsieh, A.-K. (1997-01). Corrosion protection of copper by a self-assembled monolayer of alkanethiol. Journal of the Electrochemical Society 144 (1) : 55-64. ScholarBank@NUS Repository. | Abstract: | A self-assembled monolayer of 1-dodecanethiol (DT) was formed on a copper surface pretreated using different methods. The corrosion protection abilities of the monolayer were evaluated in an air-saturated 0.51 M NaCl solution using various techniques including electrochemical impedance spectroscopy, polarization, coulometry, weight loss, and x-ray photoelectron spectroscopy. It was found that the corrosion resistance of the monolayer was improved markedly by using a nitric acid etching method. A minimum concentration of 10-4 M DT was needed to form a protective monolayer. The DT-monolayer retarded the reduction of dissolved oxygen and inhibited the growth of copper oxide in the NaCl solution. In comparison with other inhibitors, such as benzotriazole (BTA) and mercapto-benzothiazole (MBT), the DT-monolayer showed much better corrosion resistance in aqueous solution. | Source Title: | Journal of the Electrochemical Society | URI: | http://scholarbank.nus.edu.sg/handle/10635/91429 | ISSN: | 00134651 |
Appears in Collections: | Staff Publications |
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