Please use this identifier to cite or link to this item:
|Title:||Corrosion protection of copper by a self-assembled monolayer of alkanethiol||Authors:||Feng, Y.
|Issue Date:||Jan-1997||Citation:||Feng, Y.,Teo, W.-K.,Siow, K.-S.,Gao, Z.,Tan, K.-L.,Hsieh, A.-K. (1997-01). Corrosion protection of copper by a self-assembled monolayer of alkanethiol. Journal of the Electrochemical Society 144 (1) : 55-64. ScholarBank@NUS Repository.||Abstract:||A self-assembled monolayer of 1-dodecanethiol (DT) was formed on a copper surface pretreated using different methods. The corrosion protection abilities of the monolayer were evaluated in an air-saturated 0.51 M NaCl solution using various techniques including electrochemical impedance spectroscopy, polarization, coulometry, weight loss, and x-ray photoelectron spectroscopy. It was found that the corrosion resistance of the monolayer was improved markedly by using a nitric acid etching method. A minimum concentration of 10-4 M DT was needed to form a protective monolayer. The DT-monolayer retarded the reduction of dissolved oxygen and inhibited the growth of copper oxide in the NaCl solution. In comparison with other inhibitors, such as benzotriazole (BTA) and mercapto-benzothiazole (MBT), the DT-monolayer showed much better corrosion resistance in aqueous solution.||Source Title:||Journal of the Electrochemical Society||URI:||http://scholarbank.nus.edu.sg/handle/10635/91429||ISSN:||00134651|
|Appears in Collections:||Staff Publications|
Show full item record
Files in This Item:
There are no files associated with this item.
checked on Sep 21, 2019
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.