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|Title:||Improvement of Rayleigh criterion with duty ratio characterization for subwavelength lithography||Authors:||Chua, G.S.
|Issue Date:||Mar-2004||Citation:||Chua, G.S.,Tay, C.J.,Quan, C.,Lin, Q. (2004-03). Improvement of Rayleigh criterion with duty ratio characterization for subwavelength lithography. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 22 (2) : 801-808. ScholarBank@NUS Repository.||Abstract:||The dependencies of lithographic factor k1 on illumination conditions were discussed. A modified Rayleigh's equation of coherencies on lithographic resolutions was proposed for the study. It was found that the areas of different diffraction order were captured by the pupil and were evaluated as function of wavelength. The results show that the extension of Rayleigh's equations was capable of mapping out the forbidden pitch locations for any design rules and optimizing the rule of focus.||Source Title:||Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures||URI:||http://scholarbank.nus.edu.sg/handle/10635/85295||ISSN:||10711023|
|Appears in Collections:||Staff Publications|
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