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|Title:||Transient temperature measurements of resist heating using nanothermocouples||Authors:||Chu, D.
|Issue Date:||Nov-2003||Citation:||Chu, D.,Wong, W.-K.,Goodson, K.E.,Pease, R.F.W. (2003-11). Transient temperature measurements of resist heating using nanothermocouples. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 21 (6) : 2985-2989. ScholarBank@NUS Repository.||Abstract:||The implication of nanothermocouples for measuring transient temperature of resist heating was analyzed. The variation in feature size and pattern displacement in photomask fabrication was observed due to resist heating. Transient resist heating measurements, obtained by thermocouples, were in microsecond scale. The fabrication of thin film thermocouples of gold/nickel, with 100 nm minimum junction size, on si and quartz substrates was discussed. A increase in temperature by 25 and 40 K was observed because of electron dosages of 5 and 15 μC/cm 2.||Source Title:||Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures||URI:||http://scholarbank.nus.edu.sg/handle/10635/84321||ISSN:||10711023|
|Appears in Collections:||Staff Publications|
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