Please use this identifier to cite or link to this item: https://doi.org/10.1117/12.456860
DC FieldValue
dc.titleSteam-assisted laser ablation metal substrate
dc.contributor.authorKoh, M.L.
dc.contributor.authorHong, M.H.
dc.contributor.authorZhu, S.
dc.contributor.authorLu, Y.F.
dc.date.accessioned2014-10-07T04:50:13Z
dc.date.available2014-10-07T04:50:13Z
dc.date.issued2002
dc.identifier.citationKoh, M.L., Hong, M.H., Zhu, S., Lu, Y.F. (2002). Steam-assisted laser ablation metal substrate. Proceedings of SPIE - The International Society for Optical Engineering 4426 : 47-50. ScholarBank@NUS Repository. https://doi.org/10.1117/12.456860
dc.identifier.issn0277786X
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/84224
dc.description.abstractExcimer laser irradiation has been shown to produce novel effects when used to process metallic surfaces. The effect of a thin film of steam on copper specimens has been investigated, and the results are a vast improvement in comparison to ablation in ambient air or liquid. This can be observed from the acoustic waveform detection during the ablation process. A pulsed excimer laser was used to ablate copper samples with fluence levels ranging from (2.5 J/cm2) to (3.8 J/cm2). The peak-to-peak signals detected in steam are about twice the amplitude of those obtained in air. Ablated specimens have been characterized using alpha-step scans for ablation profiles. Results show that the ablation rates with steam are higher than those done in ambient air or liquid. Discussions will focus on the assessment of factors influencing the production of such features, including laser fluence, laser pulse counts, and also the ambient processing environment.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1117/12.456860
dc.sourceScopus
dc.subjectAblation profiles
dc.subjectAcoustic waveform
dc.subjectLaser ablation
dc.subjectLaser fluence
dc.subjectLaser pulse counts and ambient processing environment
dc.typeConference Paper
dc.contributor.departmentDATA STORAGE INSTITUTE
dc.contributor.departmentELECTRICAL & COMPUTER ENGINEERING
dc.description.doi10.1117/12.456860
dc.description.sourcetitleProceedings of SPIE - The International Society for Optical Engineering
dc.description.volume4426
dc.description.page47-50
dc.description.codenPSISD
dc.identifier.isiut000176422100008
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