Please use this identifier to cite or link to this item:
https://doi.org/10.1142/S0219581X10006867
Title: | Nanoscale arrays in lithium niobate fabricated by interference lithography and dry etching | Authors: | Si, G.Y. Danner, A.J. Teng, J.H. Ang, S.S. Chew, A.B. Dogheche, E. |
Keywords: | interference lithography LiNbO3 dense arrays plasma etching |
Issue Date: | Aug-2010 | Citation: | Si, G.Y., Danner, A.J., Teng, J.H., Ang, S.S., Chew, A.B., Dogheche, E. (2010-08). Nanoscale arrays in lithium niobate fabricated by interference lithography and dry etching. International Journal of Nanoscience 9 (4) : 311-315. ScholarBank@NUS Repository. https://doi.org/10.1142/S0219581X10006867 | Abstract: | Channel waveguides have been fabricated in x-cut lithium niobate (LiNbO3) by proton exchange (PE) method and optically measured. The thickness and the optical constants of the thin PE layer were characterized using a prism coupling technique. The PE area was plasma etched and a 2.775-μm total etching depth was achieved. The measured average etching rate is 92.5 nm/min. One- and two-dimensional dense arrays of LiNbO3 nanostructures have also been fabricated by using interference lithography (IL) and inductively coupled plasma reactive ion etching (ICP-RIE) techniques. © 2010 World Scientific Publishing Company. | Source Title: | International Journal of Nanoscience | URI: | http://scholarbank.nus.edu.sg/handle/10635/83998 | ISSN: | 0219581X | DOI: | 10.1142/S0219581X10006867 |
Appears in Collections: | Staff Publications |
Show full item record
Files in This Item:
There are no files associated with this item.
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.