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Title: Nanoscale arrays in lithium niobate fabricated by interference lithography and dry etching
Authors: Si, G.Y.
Danner, A.J. 
Teng, J.H.
Ang, S.S.
Chew, A.B.
Dogheche, E.
Keywords: interference lithography
LiNbO3 dense arrays
plasma etching
Issue Date: Aug-2010
Citation: Si, G.Y., Danner, A.J., Teng, J.H., Ang, S.S., Chew, A.B., Dogheche, E. (2010-08). Nanoscale arrays in lithium niobate fabricated by interference lithography and dry etching. International Journal of Nanoscience 9 (4) : 311-315. ScholarBank@NUS Repository.
Abstract: Channel waveguides have been fabricated in x-cut lithium niobate (LiNbO3) by proton exchange (PE) method and optically measured. The thickness and the optical constants of the thin PE layer were characterized using a prism coupling technique. The PE area was plasma etched and a 2.775-μm total etching depth was achieved. The measured average etching rate is 92.5 nm/min. One- and two-dimensional dense arrays of LiNbO3 nanostructures have also been fabricated by using interference lithography (IL) and inductively coupled plasma reactive ion etching (ICP-RIE) techniques. © 2010 World Scientific Publishing Company.
Source Title: International Journal of Nanoscience
ISSN: 0219581X
DOI: 10.1142/S0219581X10006867
Appears in Collections:Staff Publications

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