Please use this identifier to cite or link to this item: https://doi.org/10.1063/1.3700224
Title: Modulation of effective Schottky barrier height of nickel silicide on silicon using pre-silicide ammonium sulfide treatment
Authors: Lim, P.S.Y.
Zhi Chi, D.
Chong Lim, P.
Yeo, Y.-C. 
Issue Date: 1-Apr-2012
Citation: Lim, P.S.Y., Zhi Chi, D., Chong Lim, P., Yeo, Y.-C. (2012-04-01). Modulation of effective Schottky barrier height of nickel silicide on silicon using pre-silicide ammonium sulfide treatment. Journal of Applied Physics 111 (7) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.3700224
Abstract: Modulation of effective electron Schottky Barrier Height (φ B n,eff) by sulfur (S) donor-like traps was achieved through the use of pre-silicide ammonium sulfide treatment. The mechanisms responsible for the reduction of φ B n,eff were elucidated through an analysis of current-voltage measurements taken at various temperatures. Owing to the different physical locations of the S donor-like traps near the metal/semiconductor junction, e.g., at the interface and in the depletion region, mechanisms such as trap-assisted tunneling (TAT) and generation of electron-hole pairs can participate in the carrier transport, and be more dominant in the low temperature regime for reducing φ B n,eff. © 2012 American Institute of Physics.
Source Title: Journal of Applied Physics
URI: http://scholarbank.nus.edu.sg/handle/10635/83974
ISSN: 00218979
DOI: 10.1063/1.3700224
Appears in Collections:Staff Publications

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