Please use this identifier to cite or link to this item:
https://doi.org/10.1166/jnn.2011.2704
DC Field | Value | |
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dc.title | Ion beam modification of exchange coupling to fabricate patterned media | |
dc.contributor.author | Ranjbar, M. | |
dc.contributor.author | Piramanayagam, S.N. | |
dc.contributor.author | Sbiaa, R. | |
dc.contributor.author | Aung, K.O. | |
dc.contributor.author | Guo, Z.B. | |
dc.contributor.author | Chong, T.C. | |
dc.date.accessioned | 2014-10-07T04:46:07Z | |
dc.date.available | 2014-10-07T04:46:07Z | |
dc.date.issued | 2011-03 | |
dc.identifier.citation | Ranjbar, M., Piramanayagam, S.N., Sbiaa, R., Aung, K.O., Guo, Z.B., Chong, T.C. (2011-03). Ion beam modification of exchange coupling to fabricate patterned media. Journal of Nanoscience and Nanotechnology 11 (3) : 2611-2614. ScholarBank@NUS Repository. https://doi.org/10.1166/jnn.2011.2704 | |
dc.identifier.issn | 15334880 | |
dc.identifier.uri | http://scholarbank.nus.edu.sg/handle/10635/83868 | |
dc.description.abstract | For bit-patterned media, media with low remanent magnetization (M r) and high M r regions are needed for storing information, which is usually achieved by lithographically defining magnetic and non-magnetic regions. In this work, we have investigated the use of ion beam modification of media surface to define the low and high M r states using a medium that is at a low M r state to start with. The low M r state is achieved by the use of synthetic antiferromagnetic coupling obtained in Co-alloy/Ru/Co-alloy trilayer structured film. Local ion beam modification at 30 keV energy using Ga ions was used to create high M r regions. AFM and MFM observations indicated that patterned regions of low and high M r can be observed with ion beam irradiation. This technique is a potential method to achieve patterned media without the need of planarization techniques. © 2011 American Scientific Publishers. | |
dc.description.uri | http://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1166/jnn.2011.2704 | |
dc.source | Scopus | |
dc.subject | Antiferromagnetically coupled media | |
dc.subject | Focused ion beam | |
dc.subject | Magnetic materials | |
dc.subject | Nanofabrication | |
dc.subject | Patterning | |
dc.type | Conference Paper | |
dc.contributor.department | ELECTRICAL & COMPUTER ENGINEERING | |
dc.description.doi | 10.1166/jnn.2011.2704 | |
dc.description.sourcetitle | Journal of Nanoscience and Nanotechnology | |
dc.description.volume | 11 | |
dc.description.issue | 3 | |
dc.description.page | 2611-2614 | |
dc.identifier.isiut | 000288102300121 | |
Appears in Collections: | Staff Publications |
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