Please use this identifier to cite or link to this item: https://doi.org/10.1117/12.446547
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dc.titleIdentification of deep levels in π-GaN epilayers
dc.contributor.authorSoh, C.B.
dc.contributor.authorChi, D.Z.
dc.contributor.authorLim, H.F.
dc.contributor.authorChua, S.J.
dc.date.accessioned2014-10-07T04:45:28Z
dc.date.available2014-10-07T04:45:28Z
dc.date.issued2001
dc.identifier.citationSoh, C.B., Chi, D.Z., Lim, H.F., Chua, S.J. (2001). Identification of deep levels in π-GaN epilayers. Proceedings of SPIE - The International Society for Optical Engineering 4594 : 211-220. ScholarBank@NUS Repository. https://doi.org/10.1117/12.446547
dc.identifier.issn0277786X
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/83813
dc.description.abstractIn this paper, the deep level defects in π-GaN Schottky and the p/π GaN diodes have been studied using digital deep level transient spectroscopy (DLTS). The alternative isothermal technique offered by the DL8000 system is used in complement to conventional temperature scan technique. Electron trap levels at Ec -Et ∼ (0.23 - 0.27 eV) are detected for p/π diode and π-type Schottky diodes by both techniques. Although similar activation energy is obtained, it appears that the traps are associated with different defects, based on the observation of different capture cross-sections (10-16cm2 for π-type Schottky and 10-19cm2 for p/π diodes) and different capture kinetics (exponential for π-type Schottky and logarithmic for p/π diodes). In addition, three other electron traps are found for the π-type Schottky diode at higher temperatures with Ec Et ∼ 0.56 eV, Ec -Et ∼ 0.82 eV and Ec-Et∼ 1.07 eV. The Ec -Et ∼ 0.56 eV and Ec -Et ∼ 0.82 eV traps in π-type Schottky and the Ec -Et ∼ 0.23 eV trap level in p/π diode are attributed to extended defects. For the p/π diode, a minority carrier (hole) trap level is also identified under minority carrier injection, with an energy position at Et -Ev ∼ 0.85eV and a capture cross-section of 8.129×10-14 cm2. This level might be related to the same defects that gives rise to yellow luminescence detected in π-GaN layer.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1117/12.446547
dc.sourceScopus
dc.subjectDLTS
dc.subjectGaN
dc.subjectLogarithmic capture kinetic
dc.subjectTransient capacitance
dc.typeConference Paper
dc.contributor.departmentELECTRICAL & COMPUTER ENGINEERING
dc.description.doi10.1117/12.446547
dc.description.sourcetitleProceedings of SPIE - The International Society for Optical Engineering
dc.description.volume4594
dc.description.page211-220
dc.description.codenPSISD
dc.identifier.isiut000174901400025
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