Please use this identifier to cite or link to this item:
|Title:||Formation of nanoimprinting mould through use of nanosphere lithography||Authors:||Wang, B.
B2. Colloidal crystals
B2. Dielectric materials
B2. Nanoimprint lithography
B2. Nanosphere lithography
B2. Photonic crystals
|Issue Date:||2-Feb-2006||Citation:||Wang, B., Zhao, W., Chen, A., Chua, S.-J. (2006-02-02). Formation of nanoimprinting mould through use of nanosphere lithography. Journal of Crystal Growth 288 (1) : 200-204. ScholarBank@NUS Repository. https://doi.org/10.1016/j.jcrysgro.2005.12.051||Abstract:||Two-dimensional (2D) photonic crystal (PC) fabrication is generally carried out by electron beam lithography (EBL). This technique is very expensive and has a low throughput because it works serially. In this paper, we report an inexpensive, fast and simple nano-fabrication technique for creating nanostructures based on nanoimprint lithography (NIL) and nanosphere lithography (NSL) techniques. A monolayer of self-assembled polystyrene colloidal particle is used as a mask for dry etching of SiO2 to create periodic ordered nano-plates on glass. Then the nanopatterns are transferred by imprinting onto a polymer film or poly (methyl methacrylate) (PMMA)-coated Si substrate. Preliminary results show that this technique is a promising way to fabricate 2D photonic crystals. © 2005 Elsevier B.V. All rights reserved.||Source Title:||Journal of Crystal Growth||URI:||http://scholarbank.nus.edu.sg/handle/10635/83742||ISSN:||00220248||DOI:||10.1016/j.jcrysgro.2005.12.051|
|Appears in Collections:||Staff Publications|
Show full item record
Files in This Item:
There are no files associated with this item.
checked on Jul 5, 2020
WEB OF SCIENCETM
checked on Jun 26, 2020
checked on Jun 28, 2020
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.