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|Title:||Fabrication of Ni80Fe20 antidot nanostructures using KrF lithography||Authors:||Wang, C.C.
|Issue Date:||2005||Citation:||Wang, C.C.,Adeyeye, A.O.,Singh, N. (2005). Fabrication of Ni80Fe20 antidot nanostructures using KrF lithography. 2005 5th IEEE Conference on Nanotechnology 2 : 95-98. ScholarBank@NUS Repository. https://doi.org/10.1109/NANO.2005.1500660||Abstract:||We have fabricated arrays of nanometric ferromagnetic antidot structures over a very large area using KrF lithography at 248nm exposure wavelength. The antidot structure displays novel magnetic properties which are different from the continuous film. We have characterized in detail both the magnetic and transport properties. ©2005 IEEE.||Source Title:||2005 5th IEEE Conference on Nanotechnology||URI:||http://scholarbank.nus.edu.sg/handle/10635/83725||ISBN:||0780391993||DOI:||10.1109/NANO.2005.1500660|
|Appears in Collections:||Staff Publications|
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