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https://doi.org/10.1149/1.2986827
DC Field | Value | |
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dc.title | Enhanced Ge MOS device performance through a novel post-gate CF 4-plasma treatment process | |
dc.contributor.author | Xie, R. | |
dc.contributor.author | Thamarai, M. | |
dc.contributor.author | Sun, Z. | |
dc.contributor.author | Yu, M. | |
dc.contributor.author | Lai, D.M.Y. | |
dc.contributor.author | Chan, L. | |
dc.contributor.author | Zhu, C. | |
dc.date.accessioned | 2014-10-07T04:44:11Z | |
dc.date.available | 2014-10-07T04:44:11Z | |
dc.date.issued | 2008 | |
dc.identifier.citation | Xie, R., Thamarai, M., Sun, Z., Yu, M., Lai, D.M.Y., Chan, L., Zhu, C. (2008). Enhanced Ge MOS device performance through a novel post-gate CF 4-plasma treatment process. ECS Transactions 16 (10) : 707-716. ScholarBank@NUS Repository. https://doi.org/10.1149/1.2986827 | |
dc.identifier.isbn | 9781566776561 | |
dc.identifier.issn | 19385862 | |
dc.identifier.uri | http://scholarbank.nus.edu.sg/handle/10635/83699 | |
dc.description.abstract | A post-gate CF4-plasma treatment process is proposed and demonstrated on Ge MOS devices and the effects of F incorporation have been extensively studied on both high-k/Ge gate stacks without any surface passivation and with Si surface passivation. Our results show that: (1) F is effectively introduced into the gate stack by CF4 treatment and segregates near high-k/Ge interface; (2) Electrical characteristics like D it, gate leakage, C-V hysteresis and breakdown voltage are improved after F incorporation; (3) Post-gate CF4 treatment is also compatible with pre-gate surface passivation, and it can further enhance the device performance. By combining Si surface passivation and post-gate CF4 treatment, interface quality has been greatly improved for high-k/Ge gate stack and a high peak hole mobility of 376 cm4/Vs has been achieved for Ge pMOSFETs. ©The Electrochemical Society. | |
dc.description.uri | http://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1149/1.2986827 | |
dc.source | Scopus | |
dc.type | Conference Paper | |
dc.contributor.department | ELECTRICAL & COMPUTER ENGINEERING | |
dc.description.doi | 10.1149/1.2986827 | |
dc.description.sourcetitle | ECS Transactions | |
dc.description.volume | 16 | |
dc.description.issue | 10 | |
dc.description.page | 707-716 | |
dc.identifier.isiut | 000273336700077 | |
Appears in Collections: | Staff Publications |
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