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|Title:||Direct magnetic patterning of nonferromagnetic Co-C thin films by electron-beam radiation||Authors:||Zhou, T.J.
|Keywords:||CoC thin films
Magnetic phase change
Patterned magnetic nanostructure
|Issue Date:||Sep-2002||Citation:||Zhou, T.J., Zhao, Y., Wang, J.P., Chong, T.C., Thong, J.T.L. (2002-09). Direct magnetic patterning of nonferromagnetic Co-C thin films by electron-beam radiation. IEEE Transactions on Magnetics 38 (5 I) : 1970-1972. ScholarBank@NUS Repository. https://doi.org/10.1109/TMAG.2002.802785||Abstract:||Non-ferromagnetic Co-C thin films were magnetically patterned by electron-beam direct writing. Co50C50 films with thickness of 30-60 nm were prepared by alternately sputtering Co and C films onto C-buffered glass substrates. The as-deposited Co50C50 films are amorphous and nonferromagnetic. Magnetic patterning of the as-deposited Co50C50 film was realized by subjecting it to electron-beam radiation using a focused 30kev beam with a current of 6.6 nA and a dwell time per dot of 3.8 s and longer. The smallest magnetic dot diameter produced by a dwell time per dot of 3.8 s is about 270 nm. The magnetic dot diameter increases linearly with the square root of dwell time per dot, which implies that the magnetic dots are produced by heat-conduction-induced phase change in the film. The magnetic measurements show that the dots are magnetically soft. The present nanolithography is potentially a flexible alternative to fabricate patterned magnetic nanostructures for submicrometer magnetic devices.||Source Title:||IEEE Transactions on Magnetics||URI:||http://scholarbank.nus.edu.sg/handle/10635/83633||ISSN:||00189464||DOI:||10.1109/TMAG.2002.802785|
|Appears in Collections:||Staff Publications|
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