Please use this identifier to cite or link to this item: https://doi.org/10.1016/j.jcrysgro.2004.04.079
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dc.titleDepth-resolved luminescence imaging of epitaxial lateral overgrown GaN using ionoluminescence
dc.contributor.authorTeo, E.J.
dc.contributor.authorBettiol, A.A.
dc.contributor.authorOsipowicz, T.
dc.contributor.authorHao, M.
dc.contributor.authorChua, S.J.
dc.contributor.authorLiu, Y.Y.
dc.date.accessioned2014-10-07T04:43:06Z
dc.date.available2014-10-07T04:43:06Z
dc.date.issued2004-08-01
dc.identifier.citationTeo, E.J., Bettiol, A.A., Osipowicz, T., Hao, M., Chua, S.J., Liu, Y.Y. (2004-08-01). Depth-resolved luminescence imaging of epitaxial lateral overgrown GaN using ionoluminescence. Journal of Crystal Growth 268 (3-4 SPEC. ISS.) : 494-498. ScholarBank@NUS Repository. https://doi.org/10.1016/j.jcrysgro.2004.04.079
dc.identifier.issn00220248
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/83605
dc.description.abstractIn this article, we utilize energetic mega-electron-volt (MeV) H + to excite light emission from epitaxial lateral overgrown GaN. Due to the high-penetration depth of MeV ions, this technique allows us to probe several microns below the surface, down to the interface region. Spatially and depth-resolved yellow luminescence imaging is carried out using a focused H + beam with energies of 0.5, 0.75 and 1MeV. Results show an increase of the yellow luminescence with depth in the window regions with respect to the wing regions. Since the threading dislocations propagate to the surface, this suggests that the yellow luminescence is due to the point defects rather than threading dislocations. © 2004 Elsevier B.V. All rights reserved.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1016/j.jcrysgro.2004.04.079
dc.sourceScopus
dc.subjectA1. Cathodoluminescence
dc.subjectA1. Depth-resolved
dc.subjectA1. Ionoluminescence
dc.subjectB1. Epitaxial lateral overgrown GaN
dc.typeConference Paper
dc.contributor.departmentPHYSICS
dc.contributor.departmentELECTRICAL & COMPUTER ENGINEERING
dc.description.doi10.1016/j.jcrysgro.2004.04.079
dc.description.sourcetitleJournal of Crystal Growth
dc.description.volume268
dc.description.issue3-4 SPEC. ISS.
dc.description.page494-498
dc.description.codenJCRGA
dc.identifier.isiut000223087000030
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