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|dc.title||Comparison of bit-patterned media fabricated by methods of direct deposition and ion-milling of cobalt/palladium multilayers|
|dc.contributor.author||Huei Leong, S.|
|dc.identifier.citation||Thiyagarajah, N., Huang, T., Chen, Y., Duan, H., Song, D.L.Y., Huei Leong, S., Yang, J.K.W., Ng, V. (2012-05-15). Comparison of bit-patterned media fabricated by methods of direct deposition and ion-milling of cobalt/palladium multilayers. Journal of Applied Physics 111 (10) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.4714547|
|dc.description.abstract||In the fabrication of bit-patterned media (BPM), two processes are commonly used, i.e., the pattern transfer by ion-milling into an underlying film of magnetic material, and the direct deposition of the magnetic material onto a pre-patterned substrate. We experimentally compared the switching performance of the BPM based on Co/Pd multilayers fabricated using these methods in terms of their switching field distribution (SFD) and physical characteristics of the bits. Our results show that both methods resulted in a narrow (∼15) SFD at low areal recording densities of ∼0.15 Tdot/in 2. However, at higher densities of up to 0.6 Tdot/in 2, the SFD of the ion-milled samples detrimentally broadened to ∼30 while the BPM from the direct-deposition method maintained its narrow SFD up to a high bit density of 0.6 Tdot/in 2. Our results suggest that in Co/Pd multilayer systems, the direct-deposition method, which produces more uniform bit sizes and profiles especially at high bit densities, is a more promising approach to achieving high-density BPM. © 2012 American Institute of Physics.|
|dc.contributor.department||ELECTRICAL & COMPUTER ENGINEERING|
|dc.description.sourcetitle||Journal of Applied Physics|
|Appears in Collections:||Staff Publications|
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